Amplification in light-induced reaction of Cu with Cl2 in the VUV

被引：4

作者：

Raaf, H ^{[1
]}

Groen, M ^{[1
]}

Schwentner, N ^{[1
]}

机构：

[1] Free Univ Berlin, Inst Phys Expt, D-14195 Berlin, Germany

来源：

APPLIED SURFACE SCIENCE | 2000年 / 154卷

关键词：

dry etching; microstructuring; photolithography; synchrotron radiation; Cu; Cl-2;

D O I：

10.1016/S0169-4332(99)00479-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A non-selective light-induced reaction was observed in the spectral range from 135 to 120 nm due to electronic excitation of Cl-2 in the gas phase to the (1)Sigma(u)(+) and 2(1)Sigma(u)(+) states. It reaches a quantum efficiency of reacted Cu per impinging photon of 174 and the underlying amplification process has an efficiency of 4 x 10(6). A selective reaction dominates between 135 and 200 nm with two prominent bands at 170 and 144 nm. It originates from a bulk-excitation with a quantum efficiency of two reacted atoms per photon. (C) 2000 Elsevier Science B.V. All rights reserved.

引用

页码：536 / 541

页数：6

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