Early Stage of Solid State Interfacial Reaction between Copper and Tin

被引:2
|
作者
Maeda, Masakatsu [1 ]
Inoue, Naoto [1 ]
Sato, Takaaki [1 ]
Takahashi, Yasuo [1 ]
机构
[1] Osaka Univ, Suita, Osaka 5650871, Japan
来源
关键词
copper; tin; interfacial structure; solid-state reaction; incubation time; COMPOUND FORMATION; DIFFUSION COUPLES; CU/SN; GROWTH; LAYERS;
D O I
10.4028/www.scientific.net/DDF.283-286.323
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
High-purity plates of Cu and Sri were diffusion bonded to clarify the early stage of the solid state interfacial reaction between Cu and Sri, focusing on the incubation time for the formation of intermetallic compounds. A clear incubation time for the formation of intermetallic compounds is observed at every temperature between 423 and 493 K. The incubation time changes depending on the annealing temperature. The interface annealed at 423 K for 3.60 ks maintains the direct interconnection between Cu and Sri being free of intermetallic compounds. The exposure of Cu surface to air affects the interfacial reaction. Annealing of the Cu/Sn interface at 493 K for 3600 s starts to form voids by using the Cu plates exposed for 8.64x10(4) s or longer to air. Furthermore, the reaction product layer formed by the same annealing condition becomes thinner when the Cu plates exposed for 8.64x10(5) s or longer to air are used.
引用
收藏
页码:323 / 328
页数:6
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