The progress on low-cost, high-quality, high-temperature superconducting tapes deposited by the combustion chemical vapor deposition process

被引:0
|
作者
Shoup, SS [1 ]
White, MK [1 ]
Krebs, SL [1 ]
Darnell, N [1 ]
King, AC [1 ]
Mattox, DS [1 ]
Campbell, IH [1 ]
Marken, KR [1 ]
Hong, S [1 ]
Czabaj, B [1 ]
Paranthaman, M [1 ]
Christen, HM [1 ]
Zhai, HY [1 ]
Specht, E [1 ]
机构
[1] MicroCoating Technol Inc, Atlanta, GA 30341 USA
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The innovative Combustion Chemical Vapor Deposition (CCVD) process is a non-vacuum technique that is being investigated to enable next generation products in several application areas including high-temperature superconductors (HTS), In combination with the Rolling Assisted Biaxially Textured Substrate (RABiTS) technology, the CCVD process has significant promise to provide low-cost, high-quality lengths of YBCO coated conductor. The CCVD technology has been used to deposit both buffer layer coatings as well as YBCO superconducting layers. A buffer layer architecture of strontium titanate and ceria have been deposited by CCVD on textured nickel substrates and optimized to appropriate thicknesses and micro structures to provide templates for growing PLD YBCO with high critical current density values, The CCVD buffer layers have been scaled to meter plus lengths with good epitaxial uniformity along the length. A short sample cut from one of the lengths enabled high critical current density PLD YBCO. Films of CCVD YBCO superconductors have been grown on single crystal substrates with critical current densities over I MA/cm(2). Work is currently in progress to combine both the buffer layer and superconductor technologies to produce high-quality coupons of HTS tape made entirely by the non-vacuum CCVD process.
引用
收藏
页码:239 / 244
页数:6
相关论文
共 50 条
  • [21] Research Progress of Large-area and High-quality Graphene Prepared by Chemical Vapor Deposition
    Shi X.
    Wang W.
    Yin Q.
    Li C.
    Cailiao Daobao/Materials Review, 2017, 31 (02): : 136 - 142
  • [22] DEVELOPMENT OF A LOW-COST, HIGH-QUALITY GRAPHICS PLOTTER
    AZMOON, M
    HEWLETT-PACKARD JOURNAL, 1982, 33 (12): : 12 - 15
  • [23] LOW-COST, HIGH-QUALITY ARTIFICIAL REVERBERATION UNIT
    LAMARE, ED
    ANSOUD, A
    JOURNAL OF THE AUDIO ENGINEERING SOCIETY, 1977, 25 (05): : 338 - 338
  • [24] High-Quality UHD Demosaicing on Low-Cost FPGA
    Baranov, Pavel S.
    Ivanov, Leonid I.
    PROCEEDINGS OF THE 2018 IEEE CONFERENCE OF RUSSIAN YOUNG RESEARCHERS IN ELECTRICAL AND ELECTRONIC ENGINEERING (EICONRUS), 2018, : 277 - 280
  • [25] A HIGH-QUALITY LOW-COST RECEIVER FOR MILITARY SONOBUOYS
    KOELSCH, DE
    HESS, FR
    MARINE GEOPHYSICAL RESEARCHES, 1981, 4 (04) : 479 - 483
  • [26] HIGH-QUALITY POLYSILICON BY AMORPHOUS LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION
    HARBEKE, G
    KRAUSBAUER, L
    STEIGMEIER, EF
    WIDMER, AE
    KAPPERT, HF
    NEUGEBAUER, G
    APPLIED PHYSICS LETTERS, 1983, 42 (03) : 249 - 251
  • [27] DEPOSITION OF HIGH-TEMPERATURE SUPERCONDUCTING FILMS BY PHYSICAL AND CHEMICAL METHODS
    SCHIEBER, M
    JOURNAL OF CRYSTAL GROWTH, 1991, 109 (1-4) : 401 - 417
  • [28] Superconducting properties of very high quality NbN thin films grown by high temperature chemical vapor deposition
    Hazra, D.
    Tsavdaris, N.
    Jebari, S.
    Grimm, A.
    Blanchet, F.
    Mercier, F.
    Blanquet, E.
    Chapelier, C.
    Hofheinz, M.
    SUPERCONDUCTOR SCIENCE & TECHNOLOGY, 2016, 29 (10):
  • [29] CHEMICAL VAPOR-DEPOSITION OF HIGH-TEMPERATURE SILICON DIOXIDE
    PHILIPOSSIAN, A
    SARKOZY, RF
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (08) : C315 - C315
  • [30] High-quality carbon nanotube growth at low temperature by pulse-excited remote plasma chemical vapor deposition
    Yamazaki, Yuichi
    Sakuma, Naoshi
    Katagiri, Masayuki
    Suzuki, Mariko
    Sakai, Tadashi
    Sato, Shintaro
    Nihei, Mizuhisa
    Awano, Yuji
    APPLIED PHYSICS EXPRESS, 2008, 1 (03) : 0340041 - 0340043