Illumination control in lensless imaging for EUV mask inspection and review

被引：7
|
作者：
Mochi, Iacopo [1 ]
Kim, Hyun-Su [1 ]
Locans, Uldis [1 ]
Dejkameh, Atoosa [1 ]
Nebling, Ricarda [1 ]
Kazazis, Dimitrios [1 ]
Ekinici, Yasin [1 ]
机构：
[1] Paul Scherrer Inst, Villigen, Switzerland
来源：
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY XI | 2020年 / 11323卷
关键词：
EUV mask review; inspection; defects; lensless imaging; coherent diffraction imaging; ptychography;
D O I：
10.1117/12.2552014
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Coherence control and flexible pupil fill play a key role in the imaging of EUV reticles. This is also true for lensless metrology applications based on coherent diffraction imaging. We describe the concept and the key components of a Fourier synthesis illuminator designed to provide the RESCAN microscope with flexible illumination capabilities and to improve its resolution limit. In particular, we discuss the characteristics of the three mirrors of the new illuminator and the requirements for their multilayer coating.
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收藏
页数：9
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