Control of Inspection for EUV Substrates and Mask Blanks

被引：0
|
作者：
Godwin, Milton
Ranganath, Teki
Ma, Andy
机构：
来源：
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVII | 2013年 / 8681卷
关键词：
defect detection; capture rate; substrate; mask blank; control chart; automatic defect classification;
D O I：
10.1117/12.2010819
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Defect inspection of EUV substrates and mask blanks must be controlled consistently to ensure repeatable and accurate defect counts. Initial sensitivity must be maintained without producing false counts. Various constructed and native defect monitors are created on substrates to track inspection tool performance. Remedies are applied to an inspection tool when monitors go out of control.
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页数：9
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