Low-Temperature Electrodeposition of CU2O Thin Films: Modulation of Micro-Nanostructure by Modifying the Applied Potential and Electrolytic Bath pH

被引：78

作者：

Bijani, S. ^{[1
]}

Martinez, L. ^{[1
]}

Gabas, M. ^{[1
]}

Dalchiele, E. A. ^{[2
]}

Ramos-Barrado, J. -R. ^{[1
]}

机构：

[1] Univ Malaga, Dept Fis Aplicada 1, Lab Mat & Superficies, E-29071 Malaga, Spain

[2] Fac Ingn, Inst Fis, Montevideo 1100, Uruguay

来源：

JOURNAL OF PHYSICAL CHEMISTRY C | 2009年 / 113卷 / 45期

关键词：

CHEMICAL-VAPOR-DEPOSITION; CUPROUS-OXIDE FILMS; ION BATTERIES; COPPER; LITHIUM; PERFORMANCE;

D O I：

10.1021/jp905952a

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Copper(I) oxide (Cu2O) films were cathodically electrodeposited on titanium substrates. The influence of several electrodeposition parameters such as applied potential, pH, and bath temperature on phase composition, degree of crystallinity, grain size, and orientation were carefully examined using X-ray diffraction and scanning electron microscopy. Two different surface morphologies with different preferential crystal orientations are found at low temperature (30 degrees C and pH 9 as a function of the applied potential. At the same temperature, highly crystalline pure Cu2O films are found at pH 12, which indicates that the crystallinity depends on the bath pH. A possible deposition mechanism is proposed, and we report on the influence of the applied potential on the crystalline structure of the deposited material.

引用

页码：19482 / 19487

页数：6

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