A 5800 μm2 Process Monitor Circuit for Measurement of in-Die Variation of Vth in 65nm

被引：2

作者：

Lisha, Liron ^{[1
]}

Bass, Ori ^{[1
]}

Shor, Joseph ^{[1
]}

机构：

[1] Bar Ilan Univ, Fac Engn, IL-52900 Ramat Gan, Israel

来源：

IEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS II-EXPRESS BRIEFS | 2021年 / 68卷 / 03期

关键词：

Sensors; process monitor; threshold voltage; sigma delta; switched capacitor circuits;

D O I：

10.1109/TCSII.2020.3020945

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A compact 5800 mu m(2) process monitor circuit is demonstrated which can measure multiple threshold voltages (Vth) locally on a die. An accurate, process/voltage/temperature-independent current source is provided to measure Vth using the constant current method to an accuracy of sigma = 3.6 mV. The output is digitized by a sigma-delta modulator with a conversion time of 2ms. The circuit enables efficient and compact in-die variation monitoring of the key process parameters and is thus useful for the high-volume characterization of integrated circuit products. The circuit contains its own reference voltage, and thus can be used for calibration during testing or in the field.

引用

页码：863 / 867

页数：5

共 17 条

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