Chemical vapor deposition of silicon thin films

被引：0
|
作者：
Schropp, REI [1 ]
机构：
[1] Univ Utrecht, Debye Inst, SID Phys Devices, NL-3508 TA Utrecht, Netherlands
来源：
CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE | 2002年 / 6卷 / 05期
关键词：
D O I：
10.1016/S1359-0286(02)00114-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：423 / 424
页数：2
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