Argon - Helicons - Magnetoplasma - Electron temperature - Optical emission spectroscopy - Plasma density;
D O I:
10.1049/hve2.12018
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
The electric double layer in argon helicon plasma by using floating electrostatic probe and local optical emission spectroscopy under different external magnetic field was investigated. Results show that electrons generated in the plasma source can be magnetized by the magnetic field and transported by the gradient of diverging magnetic field in the diffusion chamber, giving rise to the hollowed distribution of electron temperature. The electron temperature on axis has a sudden decrease, leading to the sudden decrease of plasma density as well as the plasma potential, forming a double layer structure. The position of double layer moves along with the position of diverging magnetic field, and the potential drop increases along with the strength of magnetic field. The structure of the external magnetic field plays the decisive factor for the double layer in helicon plasma.
机构:
Soochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Soochow Univ, Key Lab Thin Films Jiangsu, Suzhou 215006, Peoples R ChinaSoochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Jin, C. G.
Yu, T.
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机构:
Soochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Soochow Univ, Key Lab Thin Films Jiangsu, Suzhou 215006, Peoples R ChinaSoochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Yu, T.
Zhao, Y.
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机构:
Soochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Soochow Univ, Key Lab Thin Films Jiangsu, Suzhou 215006, Peoples R ChinaSoochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Zhao, Y.
Bo, Y.
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机构:
Soochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Soochow Univ, Key Lab Thin Films Jiangsu, Suzhou 215006, Peoples R ChinaSoochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Bo, Y.
Ye, C.
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h-index: 0
机构:
Soochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Soochow Univ, Key Lab Thin Films Jiangsu, Suzhou 215006, Peoples R ChinaSoochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Ye, C.
Hu, J. S.
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机构:
Chinese Acad Sci ASIPP, Inst Plasma Phys, Hefei 230031, Peoples R ChinaSoochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Hu, J. S.
Zhuge, L. J.
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机构:
Soochow Univ, Key Lab Thin Films Jiangsu, Suzhou 215006, Peoples R China
Soochow Univ, Anal & Testing Ctr, Suzhou 215006, Peoples R ChinaSoochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Zhuge, L. J.
Ge, S. B.
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机构:
Soochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Soochow Univ, Key Lab Thin Films Jiangsu, Suzhou 215006, Peoples R ChinaSoochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Ge, S. B.
Wu, X. M.
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h-index: 0
机构:
Soochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Soochow Univ, Key Lab Thin Films Jiangsu, Suzhou 215006, Peoples R ChinaSoochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Wu, X. M.
Ji, H. T.
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机构:
Princeton Univ, Princeton Plasma Phys Lab, Princeton, NJ 08543 USASoochow Univ, Dept Phys, Suzhou 215006, Peoples R China
Ji, H. T.
Li, J. G.
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机构:
Chinese Acad Sci ASIPP, Inst Plasma Phys, Hefei 230031, Peoples R ChinaSoochow Univ, Dept Phys, Suzhou 215006, Peoples R China
机构:
Australian Natl Univ, Res Sch Phys & Engn, Space Plasma Power & Prop Lab, Canberra, ACT 0200, AustraliaAustralian Natl Univ, Res Sch Phys & Engn, Space Plasma Power & Prop Lab, Canberra, ACT 0200, Australia
Cox, Wes
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Hawkins, Rhys
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机构:
Charles, Christine
Boswell, Rod W.
论文数: 0引用数: 0
h-index: 0
机构:
Australian Natl Univ, Res Sch Phys & Engn, Space Plasma Power & Prop Lab, Canberra, ACT 0200, AustraliaAustralian Natl Univ, Res Sch Phys & Engn, Space Plasma Power & Prop Lab, Canberra, ACT 0200, Australia
Boswell, Rod W.
Laine, Robert
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h-index: 0
机构:
Astrium, EADS, F-75016 Paris, FranceAustralian Natl Univ, Res Sch Phys & Engn, Space Plasma Power & Prop Lab, Canberra, ACT 0200, Australia
Laine, Robert
Perren, Matthew
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h-index: 0
机构:
Astrium, EADS, F-75016 Paris, FranceAustralian Natl Univ, Res Sch Phys & Engn, Space Plasma Power & Prop Lab, Canberra, ACT 0200, Australia
机构:
Australian Natl Univ, Res Sch Phys & Engn, Space Plasma Power & Prop Grp, Canberra, ACT 0200, AustraliaAustralian Natl Univ, Res Sch Phys & Engn, Space Plasma Power & Prop Grp, Canberra, ACT 0200, Australia
Boswell, Rod
Cox, Wes
论文数: 0引用数: 0
h-index: 0
机构:
Australian Natl Univ, Res Sch Phys & Engn, Space Plasma Power & Prop Grp, Canberra, ACT 0200, AustraliaAustralian Natl Univ, Res Sch Phys & Engn, Space Plasma Power & Prop Grp, Canberra, ACT 0200, Australia
Cox, Wes
Hatakeyama, Rikizo
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机构:
Tohoku Univ, Dept Elect Engn, Sendai, Miyagi 9808579, JapanAustralian Natl Univ, Res Sch Phys & Engn, Space Plasma Power & Prop Grp, Canberra, ACT 0200, Australia