Fabrication of nanoscale "curtain rods" for DNA curtains using nanoimprint lithography

被引:8
|
作者
Fazio, T. A. [1 ]
Visnapuu, M. [2 ]
Greene, E. C. [2 ]
Wind, S. J. [1 ]
机构
[1] Columbia Univ, Dept Appl Phys & Appl Math, New York, NY 10027 USA
[2] Columbia Univ, Dept Biochem & Mol Biophys, New York, NY 10027 USA
来源
关键词
DNA; lipid bilayers; nanolithography; nanopatterning; proteins; soft lithography; DOUBLE-STRANDED DNA; MISMATCH REPAIR; HUMAN RAD51;
D O I
10.1116/1.3259951
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The authors have developed a new lithographically based patterning process which significantly increases the throughput of experiments which probe how repair proteins scan DNA molecules for errors. In this process, nanoscale barriers are formed to interrupt the flow of a lipid bilayer in which DNA is tethered to proteins in the bilayer. The barriers trap the DNA, which is then stretched out by hydrodynamic flow, resulting in the formation of "DNA curtains." Nanoimprint lithography is used to facilitate massively parallel data collection for protein diffusion experiments on DNA.
引用
收藏
页码:3095 / 3098
页数:4
相关论文
共 50 条
  • [21] Nanoscale Patterning by UV Nanoimprint Lithography Using an Organometallic Resist
    Acikgoz, Canet
    Vratzov, Boris
    Hempenius, Mark A.
    Vancso, G. Julius
    Huskens, Jurriaan
    ACS APPLIED MATERIALS & INTERFACES, 2009, 1 (11) : 2645 - 2650
  • [22] Fabrication of nanoresonator biosensing arrays using nanoimprint lithography
    Janzen, Alex
    Poshtiban, Sommayyeh
    Singh, Amit
    Evoy, Stephane
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02):
  • [23] Nanomagnetic Logic Devices Fabrication using Nanoimprint Lithography
    Imtaar, Muhammad Atyab
    Li, Peng
    Varga, Edit
    Csaba, Gyoergy
    Bernstein, Gary H.
    Scarpa, Giuseppe
    Porod, Wolfgang
    Lugli, Paolo
    2013 13TH IEEE CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO), 2013, : 578 - 581
  • [24] Large area mold fabrication for the nanoimprint lithography using electron beam lithography
    JinKui Chu
    FanTao Meng
    ZhiTao Han
    Qing Guo
    Science in China Series E: Technological Sciences, 2010, 53 : 248 - 252
  • [25] Large area mold fabrication for the nanoimprint lithography using electron beam lithography
    Chu JinKui
    Meng FanTao
    Han ZhiTao
    Guo Qing
    SCIENCE CHINA-TECHNOLOGICAL SCIENCES, 2010, 53 (01) : 248 - 252
  • [26] Large area mold fabrication for the nanoimprint lithography using electron beam lithography
    CHU JinKui1
    2 Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education
    Science China Technological Sciences, 2010, (01) : 248 - 252
  • [27] Large area mold fabrication for the nanoimprint lithography using electron beam lithography
    CHU JinKuiMENG FanTaoHAN ZhiTao GUO Qing Key Laboratory for MicroNano Technology and System of Liaoning ProvinceDalian University of TechnologyDalian China Key Laboratory for Precision and Nontraditional Machining Technology of Ministry of EducationDalian University of TechnologyDalian China
    Science China(Technological Sciences), 2010, 53 (01) : 248 - 252
  • [28] DNA-based molecular lithography for nanoscale fabrication
    Brenan, CJH
    IEEE ENGINEERING IN MEDICINE AND BIOLOGY MAGAZINE, 2002, 21 (06): : 164 - 164
  • [29] Nanoscale control of polymer crystallization by nanoimprint lithography
    Hu, ZJ
    Baralia, G
    Bayot, V
    Gohy, JF
    Jonas, AM
    NANO LETTERS, 2005, 5 (09) : 1738 - 1743
  • [30] Reverse Nanoimprint Lithography for Fabrication of Nanostructures
    Tavakkoli K. G., A.
    Ranjbar, M.
    Piramanayagam, S. N.
    Wong, S. K.
    Poh, W. C.
    Sbiaa, R.
    Chong, T. C.
    NANOSCIENCE AND NANOTECHNOLOGY LETTERS, 2012, 4 (08) : 835 - 838