Effect of oxygen pressure on the p-type conductivity of Ga, P co-doped ZnO thin film grown by pulsed laser deposition

被引:23
|
作者
Noh, Woo-Seok [1 ]
Lee, Jung-A [1 ,2 ]
Lee, Joon-Hyung [1 ]
Heo, Young-Woo [1 ,2 ]
Kim, Jeong-Joo [1 ,2 ]
机构
[1] Kyungpook Natl Univ, Sch Mat Sci & Engn, Deagu 41566, South Korea
[2] Kyungpook Natl Univ, Res Inst Adv Energy Technol, Daegu 41566, South Korea
基金
新加坡国家研究基金会;
关键词
Thin film; Pulsed laser deposition (PLD); Zinc oxide; P-type; Co-doping; ELECTRICAL-PROPERTIES; FABRICATION; AL;
D O I
10.1016/j.ceramint.2015.11.086
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The effect of the oxygen partial pressure on the conductivity of (Ga, P) co-doped ZnO thin films (ZnO:Ga0.01P0.02, ZnO:Ga0.01P0.04) was investigated. The thin films were grown by using the pulsed laser deposition (PLD) method. As the oxygen partial pressure increased from 1 mTorr to 200 mTorr, the electron carrier concentration of the ZnO:Ga0.01P0.04 thin films decreased. Above 200 mTorr, however, the electron carrier concentration increased and a transition from n-type to p-type conductivity was observed. On the other hand, in the case of the ZnO: Ga0.01P0.02 thin films, their electron carrier concentration continuously decreased as the oxygen partial pressure increased from 1 to 500 mTorr, showing the typical n-type semi-conductive characteristics. The X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy (SIMS) analyses were used to characterize the n-type to p-type conductivity transitions with increasing oxygen partial pressure. (C) 2015 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
引用
收藏
页码:4136 / 4142
页数:7
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