A nano-metrology system with a two-dimensional combined optical and X-ray interferometer and an atomic force microscope

被引：8
|
作者：
Park, Jinwon [2 ]
Lee, Moo-Yeon [3 ]
Lee, Dong-Yeon [1 ]
机构：
[1] Yeungnam Univ, Sch Mech Engn, Gyongsan 712749, Gyeongsangbuk D, South Korea
[2] Samsung Electromech Co Ltd, Mfg Engn Ctr, Suwon, Gyeonggi Do, South Korea
[3] Korea Univ, Dept Mech Engn, Seoul 136713, South Korea
来源：
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2009年 / 15卷 / 12期
关键词：
LASER INTERFEROMETER; NONLINEARITY; COMPENSATION;
D O I：
10.1007/s00542-009-0916-0
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A two-dimensional nano-scale measuring system utilizing a two-dimensional combined optical and X-ray interferometer (2D COXI) was developed for the standardization of measurement in the nanometer region. The system consists of a 2D COXI and an atomic force microscope (AFM). The designed, two-dimensional, flexure-stage scans and the cantilever tip probes the nano-structure of the specimen. The calibrated optical interferometers in the 2D COXI were used to measure two-dimensional nano-scale lengths. The accuracy of the optical interferometers was enhanced to enable sub-nanometer measurements. To demonstrate the nano-scale measuring system, we used it to measure the nano-scale pitches of gratings.
引用
收藏
页码：1879 / 1884
页数：6
相关论文
共 50 条
  • [1] A nano-metrology system with a two-dimensional combined optical and X-ray interferometer and an atomic force microscope
    Jinwon Park
    Moo-Yeon Lee
    Dong-Yeon Lee
    [J]. Microsystem Technologies, 2009, 15 : 1879 - 1884
  • [2] Development of a two-dimensional nano-displacement measuring system utilizing a 2D combined optical and X-ray interferometer
    Park, JW
    Jo, J
    Byun, S
    Kim, JW
    Eom, TB
    Eom, CI
    [J]. JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2006, 48 (01) : 28 - 32
  • [3] Two-Dimensional X-Ray Grating Interferometer
    Zanette, Irene
    Weitkamp, Timm
    Donath, Tilman
    Rutishauser, Simon
    David, Christian
    [J]. PHYSICAL REVIEW LETTERS, 2010, 105 (24)
  • [4] Dual imaging unit atomic force microscope and its applications in wide-range nano-metrology
    Lin, Xiaofeng
    Zhang, Haijun
    Zhang, Dongxian
    [J]. 2005, Science Press, Beijing, China (26):
  • [5] A combined scanning tunnelling microscope and x-ray interferometer
    Yacoot, A
    Kuetgens, U
    Koenders, L
    Weimann, T
    [J]. MEASUREMENT SCIENCE AND TECHNOLOGY, 2001, 12 (10) : 1660 - 1665
  • [6] Nano-metrology: The art of measuring X-ray mirrors with slope errors <100 nrad
    Alcock, Simon G.
    Nistea, Ioana
    Sawhney, Kawal
    [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 2016, 87 (05):
  • [7] Combined optical and X-ray interferometry for high-precision dimensional metrology
    Basile, G
    Becker, P
    Bergamin, A
    Cavagnero, G
    Franks, A
    Jackson, K
    Kuetgens, U
    Mana, G
    Palmer, EW
    Robbie, CJ
    Stedman, M
    Stümpel, J
    Yacoot, A
    Zosi, G
    [J]. PROCEEDINGS OF THE ROYAL SOCIETY A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES, 2000, 456 (1995): : 701 - 729
  • [8] Development of a Combined Optical and X-ray Interferometer (COXI) system for nanometrology
    Yim, NB
    Kim, MS
    Eom, CI
    [J]. LASER INTERFEROMETRY IX: APPLICATIONS, 1998, 3479 : 94 - 101
  • [9] X-ray wavefront analysis and phase reconstruction with a two-dimensional shearing interferometer
    Baker, Kevin L.
    [J]. OPTICAL ENGINEERING, 2009, 48 (08)
  • [10] Two-dimensional image magnification in an asymmetric-reflection X-ray microscope
    A. V. Andreev
    V. E. Asadchikov
    A. V. Buzmakov
    A. A. Konovko
    S. V. Kuzin
    A. A. Pertsov
    Yu. V. Ponomarev
    R. A. Senin
    I. S. Smirnov
    S. V. Shestov
    V. N. Shkurko
    [J]. JETP Letters, 2007, 85 : 98 - 100
12345