Monolayer Transition Metal Dichalcogenide and Black Phosphorus Transistors for Low Power Robust SRAM Design

被引:1
|
作者
Rakshit, Joydeep [1 ]
Wan, Runlai [2 ]
Lam, Kai Tak [2 ]
Guo, Jing [2 ]
Mohanram, Kartik [1 ]
机构
[1] Univ Pittsburgh, Dept Elect & Comp Engn, Pittsburgh, PA USA
[2] Univ Florida, Dept Elect & Comp Engn, Gainesville, FL USA
基金
美国国家科学基金会;
关键词
Monolayer FET SRAM; static power; noise margins;
D O I
10.1145/2744769.2744872
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Vertical monolayer heterojunction FETs based on transition metal dichalcogenides (TMDCFETs) and planar black phosphorus FETs (BPFETs) have demonstrated excellent sub-threshold swing, high ION/loFF, and high scalability, making them attractive candidates for post-CMOS memory design. This paper explores TMDCFET and BPFET SRAM design by combining atomistic self-consistent device modeling with SRAM circuit design and simulation. Our simulations show that at low operating voltages, TMDCFET and BPFET SRAMs exhibit significant advantages in static power, dynamic read/write noise margin, and read/write delay over both nominal and read/write-assisted 16nm CMOS SRAMs.
引用
收藏
页数:6
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