Transient phase masks in high-harmonic generation

被引:5
|
作者
Mairesse, Y. [1 ]
Dudovich, N.
Levesque, J.
Kartashov, D.
Villeneuve, D. M.
Corkum, P. B.
Auguste, T.
机构
[1] Natl Res Council Canada, Steacie Inst Mol Sci, Ottawa, ON K1A 0R6, Canada
[2] CEA, DSM, DRECAM, SPAM, F-91191 Gif Sur Yvette, France
关键词
D O I
10.1364/OL.32.000436
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We present a method for controlling the spatial properties of high-harmonic beams with high efficiency. The high nonlinearity of harmonic generation allows weak control beams to induce a phase mask for the extreme UV light as it is formed. We fabricate a phase grating and demonstrate efficient diffraction in the far field. Diffractive elements formed in this way are transient. Since they are induced by the subcycle interaction of the medium with the fundamental and control fields, they can be extended to the attosecond time scale.
引用
收藏
页码:436 / 438
页数:3
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