Optical Characterization of High-Order 1-D Silicon Photonic Crystals

被引:33
|
作者
Barillaro, Giuseppe [1 ]
Strambini, Lucanos Marsilio [1 ]
Annovazzi-Lodi, Valerio [2 ]
Merlo, Sabina [2 ]
机构
[1] Univ Pisa, Dipartimento Ingn Informaz, I-56122 Pisa, Italy
[2] Univ Pavia, Dipartimento Elettron, I-27100 Pavia, Italy
关键词
Micromachining; optical components; optical device fabrication; optical reflection; photonic bandgap materials; silicon; FABRICATION;
D O I
10.1109/JSTQE.2009.2017278
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, we present numerical and experimental results on the spectral reflectivity of hybrid, high-order (up to 22nd) 1-D silicon photonic crystals (PCs) in the near-infrared region (wavelength range 1-1.7 mu m). Mechanically robust, vertical 1-D PCs with high aspect ratio and spatial period of 8 mu m were fabricated by electrochemical micromachining of silicon, and tested in reflection with an improved optical setup, incorporating standard telecommunication single-mode optical fibers and a lensed fiber pigtail. A detailed theoretical, numerical analysis was performed to assess the effects of both non-idealities of the structures under test and constraints of the optical setup, on the spectral reflectivity. Experimental data were found in very good agreement with theoretical calculations, performed by using the characteristic matrix method, keeping into account an in-plane porosity variation for I-D PCs, due to surface roughness of silicon walls, and the limited resolution bandwidth of the spectrum analyzer. Best optical performances, measured on the fabricated 1-D PC mirrors, consist of optical losses less than 0.8 dB in a bandgap around 1.5 mu m and a -35 dB reflectivity minimum at a bandgap edge.
引用
收藏
页码:1359 / 1367
页数:9
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