Intrasheath electron dynamics in low pressure capacitively coupled plasmas

被引：12
|
作者：
Vass, Mate [1 ,2 ]
Derzsi, Aranka [2 ]
Schulze, Julian [1 ,3 ]
Donko, Zoltan [2 ]
机构：
[1] Ruhr Univ Bochum, Dept Elect Engn & Informat Sci, D-44780 Bochum, Germany
[2] Wigner Res Ctr Phys, Inst Solid State Phys & Opt, Konkoly Thege Miklos Str 29-33, H-1121 Budapest, Hungary
[3] Dalian Univ Technol, Sch Phys, Minist Educ, Key Lab Mat Modificat Laser Ion & Electron Beams, Dalian 116024, Peoples R China
来源：
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2021年 / 30卷 / 03期
关键词：
capacitively coupled plasmas; charged particle dynamics; particle-in-cell simulations; SIMULATION;
D O I：
10.1088/1361-6595/abe728
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
We present a detailed analysis of electron trajectories within the sheath regions of capacitively coupled plasmas excited by radio-frequency voltage waveforms at low pressures. Complex features inside the sheaths are identified in several physical quantities, which are sculptured by the trajectories of bouncing energetic electrons (predominantly ion induced secondary electrons) under the influence of the spatio-temporally varying electric field. Based on a systematic parameter variation the generation of the various features as a function of surface processes is explained and the trajectories of electrons of different origin are identified.
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页数：6
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