Production issues for high aspect ratio Lobster-eye optics using LIGA

被引:2
|
作者
Peele, A. G. [1 ]
Vora, K. D.
Shew, B. -Y.
Loechl, B.
Harvey, E. C.
Hayes, J. P.
机构
[1] La Trobe Univ, Dept Phys, Bundoora, Vic 3086, Australia
[2] Natl Synchrotron Radiat Res Ctr, Device Technol Grp, Hsinchu 30077, Taiwan
[3] BESSY Berliner Elektronenspeicherring Gesell mbH, Anwenderzentrum Mikrotech, D-12489 Berlin, Germany
[4] Swinburne Univ Technol, Ind Res Inst Swinburne, Hawthorn, Vic 3122, Australia
来源
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2007年 / 13卷 / 5-6期
关键词
D O I
10.1007/s00542-006-0188-x
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have previously considered some of the parameters for, and production issues involved in making, a useful Lobster-eye prototype using X-ray lithography. Due to the high aspect ratio and dense packing of the array features, we were unable, in our initial attempts to produce optimal Lobster-eye optics using X-ray lithography and a PMMA resist, to consistently overcome adhesion issues between the substrate and the resist. In recent work we have overcome this problem by using SU-8 as the resist instead. In the light of this advance we reconsider the relevant parameters and production issues when using SU-8 and lower-energy exposures.
引用
收藏
页码:511 / 515
页数:5
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