Phase transformation of A15 crystal structure chromium thin films grown by the sputter deposition

被引:17
|
作者
Chu, JP
Chang, JW
Lee, PY
机构
[1] Institute of Materials Engineering, National Taiwan Ocean University
关键词
chromium thin films; A15 crystal structure; phase transformation; RF magnetron sputtering;
D O I
10.1016/S0254-0584(97)80180-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Phase transformation of non-BCC delta-A15 Cr thin films prepared by r.f. magnetron sputtering has been characterized. Using differential scanning calorimetry (DSC), we demonstrated for the first time that the phase transformation of the delta-A15 Cr phase to the equilibrium alpha-BCC Cr phase is an irreversible, exothermic, first-order transition. At a heating rate of 10 degrees C min(-1), the onset and peak temperatures of transformation were determined to be 428 and 437 degrees C, respectively. The enthalpy change of the transformation, Delta H, was estimated to be in a range from -6 to -12 kJ mol(-1). The uncertainty of Delta H was attributed to an ill-defined transition completion temperature and an incorporation of substrate material into the DSC him samples analyzed. Our in situ DSC results confirmed the metastable and allotropic nature of delta-A15 Cr phase, which has been proposed by other prior studies using conventional ex situ X-ray and electron diffraction methods. Our X-ray photoelectron spectroscopy analyses on as-deposited and annealed films showed that while the chrome oxides or carbides were formed inevitably in annealed films the Cr and O were mostly in the unbound states. Hence, it is unlikely that the delta-A15 Cr phase is of an oxide phase.
引用
收藏
页码:31 / 36
页数:6
相关论文
共 50 条
  • [31] Phase transformation of thin sputter-deposited tungsten films at room temperature
    Rossnagel, SM
    Noyan, IC
    Cabral, C
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (05): : 2047 - 2051
  • [32] Nanoindentation of chromium zigzag thin films sputter deposited
    Lintymer, J
    Martin, N
    Chappé, J-M
    Delobelle, P
    Takadoum, J
    SURFACE & COATINGS TECHNOLOGY, 2005, 200 (1-4): : 269 - 272
  • [33] An investigation of phase transformation behavior in sputter-deposited PtMn thin films
    C. -X. Ji
    Peter F. Ladwig
    Ronald D. Ott
    Y. Yang
    Joshua J. Yang
    Y. Austin Chang
    Eric S. Linville
    Jenny Gao
    Bharat B. Pant
    JOM, 2006, 58 : 50 - 54
  • [34] Silica and alumina thin films grown by liquid phase deposition
    Sun, J
    Hu, LZ
    Wang, ZY
    Du, GT
    PRICM 5: THE FIFTH PACIFIC RIM INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS AND PROCESSING, PTS 1-5, 2005, 475-479 : 1725 - 1728
  • [35] Optical characterisation of silicon nitride thin films grown by novel remote plasma sputter deposition
    Claudio, Gianfranco
    Calnan, Sonya
    Bass, Kevin
    Boreland, Matt
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2008, 19 (Suppl 1) : S285 - S288
  • [36] Properties of gallium oxide thin films grown by ion beam sputter deposition at room temperature
    Kalanov, Dmitry
    Unutulmazsoy, Yeliz
    Spemann, Daniel
    Bauer, Jens
    Anders, Andre
    Bundesmann, Carsten
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2022, 40 (03):
  • [37] Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition
    Bundesmann, Carsten
    Bauer, Jens
    Finzel, Annemarie
    Gerlach, Juergen W.
    Knolle, Wolfgang
    Hellmich, Anke
    Synowicki, Ron
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2021, 39 (03):
  • [38] A laser-ARPES study of LaNiO3 thin films grown by sputter deposition
    Cappelli, Edoardo
    Tromp, Willem O.
    Walker, Siobhan McKeown
    Tamai, Anna
    Gibert, Marta
    Baumberger, Felix
    Bruno, Flavio Y.
    APL MATERIALS, 2020, 8 (05)
  • [39] Optical characterisation of silicon nitride thin films grown by novel remote plasma sputter deposition
    Gianfranco Claudio
    Sonya Calnan
    Kevin Bass
    Matt Boreland
    Journal of Materials Science: Materials in Electronics, 2008, 19 : 285 - 288
  • [40] Defects of A15 small particles in tungsten thin films
    Arita, M
    Nishida, I
    SURFACE REVIEW AND LETTERS, 1996, 3 (01) : 1191 - 1194