Polymeric waveguide Bragg grating filter using soft lithography

被引：36
|
作者：
Kocabas, Askin [1 ]
Aydinli, Atilla [1 ]
机构：
[1] Bilkent Univ, Dept Phys, Turk Telekom Bilkent Lab, TR-06800 Ankara, Turkey
来源：
OPTICS EXPRESS | 2006年 / 14卷 / 22期
关键词：
D O I：
10.1364/OE.14.010228
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We use the soft lithography technique to fabricate a polymeric waveguide Bragg grating filter. Master grating structure is patterned by e-beam lithography. Using an elastomeric stamp and capillary action, uniform grating structures with very thin residual layers are transferred to the UV curable polymer without the use of an imprint machine. The waveguide layer based on BCB optical polymer is fabricated by conventional optical lithography. This approach provides processing simplicity to fabricate Bragg grating filters. (c) 2006 Optical Society of America
引用
收藏
页码：10228 / 10232
页数：5
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