Submicron CMOS technologies for low-noise analog front-end circuits

被引:40
|
作者
Manghisoni, M [3 ]
Ratti, L
Re, V
Speziali, V
机构
[1] Univ Bergamo, Dipartimento Ingn, I-24044 Dalmine, BG, Italy
[2] Univ Pavia, Dipartimento Elettron, I-27100 Pavia, Italy
[3] Ist Nazl Fis Nucl, I-27100 Pavia, Italy
关键词
deep submicron; front-end electronics; MOSFET; noise;
D O I
10.1109/TNS.2002.801540
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a study of the noise behavior of submicron CMOS transistors, in view of applications to high-density mixed-signal front-end systems for high-granularity detectors. The goal of this work is extending the knowledge in this field, presently focused on 0.25 -mum processes, to the following generation of CMOS technologies (with 0.18 -mum minimum gate length). The white component of the noise voltage spectrum, which is most important for fast signal processing, and the 1/f noise contribution are experimentally characterized with noise measurements in a wide frequency range. The results of this analysis are used to establish low-noise design criteria concerning the choice of the polarity and of the channel dimensions (length and width) of the preamplifier input device in low-power operating conditions. A comparison with similar noise measurements on CMOS devices belonging to a 0.35 -mum process allows estimating the impact of gate-length scaling on both white and 1/f noise components. The noise radiation tolerance is also a key parameter for many front-end systems. It was evaluated by exposing the devices to high doses of ionizing radiation.
引用
收藏
页码:1783 / 1790
页数:8
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