Plasma deposition of parylene-C film

被引:15
|
作者
Song, Zhiquan [1 ]
Im, Ju-Hee [1 ]
Ko, Hyuk [1 ]
Park, Jun-Hee [1 ]
Lee, Ga-Yeon [1 ]
Kang, Min-Jung [2 ]
Kim, Moo-Hwan [3 ]
Pyun, Jae-Chul [1 ]
机构
[1] Yonsei Univ, Dept Mat Sci & Engn, 134 Shinchon Dong, Seoul 120749, South Korea
[2] Korea Inst Sci & Technol KIST, Seoul, South Korea
[3] Femto Sci Co, Dongtan, South Korea
来源
MATERIALS TODAY COMMUNICATIONS | 2021年 / 26卷
基金
新加坡国家研究基金会;
关键词
Parylene-C; Plasma; Thermal; Deposition; Instrumentation; CHEMICAL-VAPOR-DEPOSITION; ELECTRICAL-PROPERTIES; SURFACE MODIFICATION; SPR BIOSENSOR; THIN-FILMS; BIOCOMPATIBILITY; TEMPERATURE; FABRICATION; EFFICIENCY; ELECTRODE;
D O I
10.1016/j.mtcomm.2020.101834
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A new method that uses plasma energy for the deposition of parylene-C films is presented. The equipment and instrumentation for the plasma deposition of parylene-C films were developed and constructed by combining evaporation and plasma-generating units. The plasma deposition of parylene-C films consists of three steps: evaporation, decomposition of the parylene-C dimers using plasma, and deposition of the film. The entire deposition process from evaporation to deposition was designed to be completed within 20 min for a parylene-C film with a thickness of less than 200 nm. The thickness of the parylene-C film was controlled in the range of 100-200 nm by adjusting the amount of parylene-C dimer as well as the plasma energy. The parylene-C films prepared by plasma deposition were characterized and compared with those obtained using the conventional pyrolysis method. The comparison included the chemical properties (chemical functional groups, atomic compositions) and their physical properties (density, crystallinity, absorption in the visible wavelength range, surface roughness and contact angle).
引用
收藏
页数:11
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