Fabrication and device simulation of single nano-scale organic static induction transistors

被引:4
|
作者
Ohashi, Noboru [1 ]
Nakamura, Masakazu [1 ]
Muraishi, Norio [1 ]
Sakai, Masatoshi [1 ]
Kudo, Kazuhiro [1 ]
机构
[1] Chiba Univ, Chiba 2638522, Japan
来源
IEICE TRANSACTIONS ON ELECTRONICS | 2006年 / E89C卷 / 12期
关键词
organic SIT; nanostructures; AFM; colloidal lithography; semiconductor device simulation;
D O I
10.1093/ietele/e89-c.12.1765
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A well-defined test structure of organic static-induction transistor (SIT) having regularly sized nano-apertures in the gate electrode has been fabricated by colloidal lithography using 130-nm-diameter polystyrene spheres as shadow masks during vacuum deposition. Transistor characteristics of individual nano-apertures, namely 'nano-SIT,' have been measured using a conductive atomic-force-microscope (AFM) probe as a movable source electrode. Position of the source electrode is found to be more important to increase current on/off ratio than the distance between source and gate electrodes. Experimentally obtained maximum on/off ratio was 710 (at V-DS = -4 V, V-GS = 0 and 2 V) when a source electrode was fixed at the edge of gate aperture. The characteristics have been then analyzed using semiconductor device simulation by employing a strongly non-linear carrier mobility model in the CuPc layer. From device simulation, source current is found to be modulated not only by a saddle point potential in the gate aperture area but also by a pinch-off effect near the source electrode. According to the obtained results, a modified structure of organic SIT and an adequate acceptor concentration is proposed. On/off ratio of the modified organic SIT is expected to be similar to 100 times larger than that of a conventional one.
引用
收藏
页码:1765 / 1770
页数:6
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