Temperature dependence of atomic ordering and composition modulation in InAsSbBi grown by molecular beam epitaxy on GaSb substrates

被引:3
|
作者
Kosireddy, R. R. [1 ,2 ]
Schaefer, S. T. [1 ,3 ]
Webster, P. T. [4 ]
Milosavljevic, M. S. [4 ,5 ]
Johnson, S. R. [1 ,3 ]
机构
[1] Arizona State Univ, Ctr Photon Innovat, Tempe, AZ 85287 USA
[2] Arizona State Univ, Sch Engn Matter Transport & Energy, Tempe, AZ 85287 USA
[3] Arizona State Univ, Sch Elect Comp & Energy Engn, Tempe, AZ 85287 USA
[4] Air Force Res Lab, Space Vehicles Directorate RVSWS, Albuquerque, NM USA
[5] Appl Technol Associates, Albuquerque, NM USA
关键词
Molecular beam epitaxy; Semiconductors; Atomic scale structure; Composition fluctuations; Rutherford backscattering spectroscopy; X-ray diffraction; Transmission electron microscopy;
D O I
10.1016/j.jallcom.2020.157860
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The structural and optical properties of two 210 nm thick InAsSbBi epilayers grown on (100) GaSb substrates by molecular beam epitaxy at 400 and 280 degrees C are investigated using X-ray diffraction, Rutherford backscattering spectroscopy, transmission electron microscopy, and photoluminescence spectroscopy. Both samples are free of observable defects. The higher temperature growth results in reduced Bi incorporation, good optical performance, smooth interfaces, and lateral composition modulation of the Bi mole fraction. The lower temperature growth results in near unity Bi incorporation, poor optical performance, interface roughness, and CuPtB -type atomic ordering on the {111}B planes. (C) 2020 Elsevier B.V. All rights reserved.
引用
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页数:8
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