Structural and Optical Properties of InAsSbBi Grown by Molecular Beam Epitaxy on Offcut GaSb Substrates

被引:1
|
作者
Kosireddy, Rajeev R. [1 ,2 ]
Schaefer, Stephen T. [1 ,3 ]
Milosavljevic, Marko S. [1 ,3 ,4 ,5 ]
Johnson, Shane R. [1 ,3 ]
机构
[1] Arizona State Univ, Ctr Photon Innovat, Tempe, AZ 85287 USA
[2] Arizona State Univ, Sch Engn Matter Transport & Energy, Tempe, AZ 85287 USA
[3] Arizona State Univ, Sch Elect Comp & Energy Engn, Tempe, AZ 85287 USA
[4] Air Force Res Lab, Space Vehicles Directorate, Kirtland Air Force Base, Albuquerque, NM 87117 USA
[5] Appl Technol Associates, Albuquerque, NM 87123 USA
关键词
semiconducting III-V alloys; bismuth compounds; molecular beam epitaxy; surfaces; high resolution X-ray diffraction; segregation; BAND-GAP; COMPOUND SEMICONDUCTORS; TEMPERATURE-DEPENDENCE; URBACH EDGE; BI; NANOSTRUCTURES; GAAS1-XBIX; EPILAYERS; CRYSTALS; STRAIN;
D O I
10.3390/photonics8060215
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Three InAsSbBi samples are grown by molecular beam epitaxy at 400 degrees C on GaSb substrates with three different offcuts: (100) on-axis, (100) offcut 1 degrees toward [011], and (100) offcut 4 degrees toward [011]. The samples are investigated using X-ray diffraction, Nomarski optical microscopy, atomic force microscopy, transmission electron microscopy, and photoluminescence spectroscopy. The InAsSbBi layers are 210 nm thick, coherently strained, and show no observable defects. The substrate offcut is not observed to influence the structural and interface quality of the samples. Each sample exhibits small lateral variations in the Bi mole fraction, with the largest variation observed in the on-axis growth. Bismuth rich surface droplet features are observed on all samples. The surface droplets are isotropic on the on-axis sample and elongated along the [01 (1) over bar] step edges on the 1 degrees and 4 degrees offcut samples. No significant change in optical quality with offcut angle is observed.
引用
收藏
页数:20
相关论文
共 50 条
  • [1] Temperature dependence of atomic ordering and composition modulation in InAsSbBi grown by molecular beam epitaxy on GaSb substrates
    Kosireddy, R. R.
    Schaefer, S. T.
    Webster, P. T.
    Milosavljevic, M. S.
    Johnson, S. R.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2021, 859
  • [2] Molecular beam epitaxy growth and optical properties of InAsSbBi
    Schaefer, S. T.
    Kosireddy, R. R.
    Webster, P. T.
    Johnson, S. R.
    JOURNAL OF APPLIED PHYSICS, 2019, 126 (08)
  • [3] Structural and optical properties of GaN films grown on GaAs substrates by molecular beam epitaxy
    Maksimov, O.
    Gong, Y.
    Du, H.
    Fisher, P.
    Skowronski, M.
    Kuskovsky, I. L.
    Heydemann, V. D.
    VACUUM, 2006, 80 (09) : 1042 - 1045
  • [4] Structural and optical characterization of GaSb on Si (001) grown by Molecular Beam Epitaxy
    Serincan, Ugur
    Arpapay, Burcu
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2019, 34 (03)
  • [5] Microstructure and surface morphology of InAsSbBi grown by molecular beam epitaxy
    Kosireddy, R. R.
    Schaefer, S. T.
    Shalindar, A. J.
    Johnson, S. R.
    JOURNAL OF APPLIED PHYSICS, 2019, 126 (09)
  • [6] Bandgap and composition of bulk InAsSbBi grown by molecular beam epitaxy
    Webster, Preston T.
    Shalindar, Arvind J.
    Schaefer, Stephen T.
    Johnson, Shane R.
    APPLIED PHYSICS LETTERS, 2017, 111 (08)
  • [8] Structural and Optical Properties of InAs/GaSb Superlattices Obtained by Molecular Beam Epitaxy
    Eroshenko, G. N.
    Krivobok, V. S.
    Minaev, I. I.
    Klekovkin, A. V.
    Savin, K. A.
    Goncharov, A. E.
    Muratov, A. V.
    Dubovaya, A. R.
    Pruchkina, A. A.
    Nikolaev, S. N.
    JOURNAL OF COMMUNICATIONS TECHNOLOGY AND ELECTRONICS, 2024, 69 (4-6) : 182 - 184
  • [9] Structural and optical properties of strained (Ga,In)Sb/GaSb quantum wells grown by molecular-beam epitaxy
    Bertru, N
    Klann, R
    Mazuelas, A
    Brandt, O
    Gaillard, S
    APPLIED PHYSICS LETTERS, 1996, 69 (15) : 2237 - 2239
  • [10] Electrical transport properties of GaSb grown by molecular beam epitaxy
    Zhao, G.Y.
    Ebisu, Hiroshi
    Soga, Tetsuo
    Egawa, Takashi
    Jimbo, Takashi
    Umeno, Masayoshi
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1998, 37 (4 A): : 1704 - 1708