Gas-phase reaction of free diethylsilylium ions with hexamethyldisiloxane

被引：3
|
作者：
Kochina, TA [1 ]
Vrazhnov, DV
Sinotova, EN
Ignat'ev, IS
机构：
[1] Russian Acad Sci, IV Grebenshchikov Silicate Chem Inst, St Petersburg 196140, Russia
[2] St Petersburg State Univ, St Petersburg, Russia
来源：
RUSSIAN JOURNAL OF GENERAL CHEMISTRY | 2005年 / 75卷 / 05期
关键词：
D O I：
10.1007/s11176-005-0303-1
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The gas-phase reaction of diethylsilylium ions with hexamethyldisiloxane was studied by the radiochemical procedure. As in reactions with other nucleophiles, the degree of rearrangement of the diethylsilylium ion in the reaction with hexamethyldisiloxane correlates with the condensation energy. In contrast to the reaction of Et2SiT+ with dibutyl ether, in the reaction with hexamethyldisiloxane the labeled substrate is formed, which is due to isomerization of the trimethylsilyl substituent giving rise to a labile hydrogen atom.
引用
收藏
页码：708 / 710
页数：3
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