High thermal stability of cross-linked aromatic self-assembled monolayers:: Nanopatterning via selective thermal desorption

被引:68
|
作者
Turchanin, A. [1 ]
El-Desawy, M. [1 ]
Goelzhaeuser, A. [1 ]
机构
[1] Univ Bielefeld, D-33615 Bielefeld, Germany
关键词
D O I
10.1063/1.2437091
中图分类号
O59 [应用物理学];
学科分类号
摘要
An extremely high thermal stability of electron cross-linked biphenyl self-assembled monolayers (SAMs) is reported. The authors found that pristine biphenylthiol SAMs desorb at similar to 400 K from gold surfaces, which is induced by a breaking of C-S bonds. Despite of a similar bond cleavage in cross-linked SAMs, these remain on the surface up to 1000 K, which is the highest temperature reported for a SAM. When patterns of pristine and cross-linked SAMs are heated, the pristine regions desorb, and the cross-linked regions remain on the surface. The authors show that this thermal desorption lithography can be utilized for the fabrication of molecular surface nanostructures.
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页数:3
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