A brief review of co-doping

被引:108
|
作者
Zhang, Jingzhao [1 ]
Tse, Kinfai [1 ]
Wong, Manhoi [1 ]
Zhang, Yiou [1 ]
Zhu, Junyi [1 ]
机构
[1] Chinese Univ Hong Kong, Dept Phys, Shatin 999077, Hong Kong, Peoples R China
关键词
co-doping; fully compensated; partially compensated; non-compensated; unintentional \doping; surfactant; P-TYPE GAN; SUBSTITUTIONAL CARBON IMPURITY; CHEMICAL-VAPOR-DEPOSITION; CODOPED MESOPOROUS TIO2; BY-LAYER GROWTH; ZNO THIN-FILMS; PHOTOCATALYTIC ACTIVITY; ENERGY-TRANSFER; BAND-GAP; ELECTRONIC-STRUCTURE;
D O I
10.1007/s11467-016-0577-2
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Dopants and defects are important in semiconductor and magnetic devices. Strategies for controlling doping and defects have been the focus of semiconductor physics research during the past decades and remain critical even today. Co-doping is a promising strategy that can be used for effectively tuning the dopant populations, electronic properties, and magnetic properties. It can enhance the solubility of dopants and improve the stability of desired defects. During the past 20 years, significant experimental and theoretical efforts have been devoted to studying the characteristics of co-doping. In this article, we first review the historical development of co-doping. Then, we review a variety of research performed on co-doping, based on the compensating nature of co-dopants. Finally, we review the effects of contamination and surfactants that can explain the general mechanisms of co-doping.
引用
收藏
页数:21
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