Low resistance Pd/Au ohmic contacts to p-type GaN using surface treatment

被引:213
|
作者
Kim, JK [1 ]
Lee, JL
Lee, JW
Shin, HE
Park, YJ
Kim, T
机构
[1] Pohang Univ Sci & Technol, Dept Mat Sci & Engn, Pohang 790784, South Korea
[2] Samsung Adv Inst Technol, Photon Lab, Suwon 440600, South Korea
关键词
D O I
10.1063/1.122641
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ohmic contact to p-type GaN with the lowest contact resistivity was developed by the surface treatment prior to Pd/Au metal deposition. The contact resistivity drastically decreased from 2.9 x 10(-2) to 4.3 x 10(-4) Ohm cm(2) by the surface treatment using aqua regia. The surface treatment plays a role in removing the surface oxide formed on p-type GaN during epitaxial growth, and subsequently in reducing the barrier height for holes at the interface of Pd/ p-type GaN, resulting in the good ohmic contacts to p-type GaN. (C) 1998 American Institute of Physics. [S0003-6951(98)01246-7].
引用
收藏
页码:2953 / 2955
页数:3
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