CHARACTERISATION OF TiO2 THIN FILMS PREPARED BY CHEMICAL BATH DEPOSITION

被引:2
|
作者
Elfanaoui, Abdeslam [1 ]
Boulkaddat, Lahcen [1 ]
Taleb, Abdelhafed [2 ]
Ihlal, Ahmed [1 ]
Elhamri, Elhoussine [1 ]
Meddah, Mohamed [1 ]
Bouabid, Khalid [1 ]
Portier, Xavier [3 ]
Outzourhit, Abdelkader [4 ]
Laanab, Larbi [5 ]
机构
[1] Univ Ibn Zohr, Dep Phys, Fac Sci, LMER, Hay Dakhla 80000, Agadir, Morocco
[2] Ecole Natl Super Chim, LECIME, F-75231 Paris 05, France
[3] Univ Caen Basse Normandie, CIMAP, CEA, CNRS,UMR 6252, F-14050 Caen, France
[4] Univ Cadi Ayyad, Fac Sci Semlalia, Lab Phys Solide & Couches Minces, Marrakech 40000, Morocco
[5] Univ Mohammed 5, Fac Sci, Ctr Microscopie, Rabat 10000, Morocco
来源
关键词
ELECTRON-BEAM EVAPORATION; PHOTOCATALYTIC ACTIVITY; VAPOR-DEPOSITION; SOL-GEL; OPTICAL-PROPERTIES; ANATASE;
D O I
10.3166/acsm.36.37-43
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Nartometer titanium dioxide (TiO2) films were successfully deposited on different substrates, glass and Indium-doped Tin Oxide (ITO), using a chemical bath deposition (CBD) method and annealed at high temperature: 600 degrees C. The structural properties were studied by X-ray diffraction (XRD), Field Emission Gun-scanning electron microscopy (FEG-SEM) and the chemical composition was investigated using energy-dispersive X-ray analysis (EDX). The optical properties of our films were studied using UV-Vis spectrophotometry. The main features of the obtained films consist in firmly adhesive and homogeneous Anatase and Rutile TiO2 films. The optical measurements reveal that the band gap value varies from 2.89 up to 3.11 eV depending strongly on the nature of the substrate.
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页码:37 / 43
页数:7
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