Effect of thermal evaporation rate on the basic physical properties of glassy (As2S3)x(As2Se3)1-x films

被引：0
|
作者：
Goglidze, T. I.
Dement'ev, I. V.
Ishimov, V. M.
Senokosov, E. A.
机构：
[1] Transnistria State Univ, MD-3300 Tiraspol, Moldova
[2] Moldova State Univ, MD-2009 Kishinev, Moldova
来源：
INORGANIC MATERIALS | 2007年 / 43卷 / 01期
关键词：
D O I：
10.1134/S0020168507010189
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We have studied the effect of thermal evaporation rate on the basic physical properties of glassy (As2S3)(x)(As2Se3)(1-x) thin films on glass substrates and have determined the optimal range of deposition rates corresponding to the highest photosensitivity and long-term stability of the films. The results are interpreted in terms of the interaction between the deposit and the residual gas in the vacuum chamber.
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页码：90 / 93
页数：4
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