Effect of thermal evaporation rate on the basic physical properties of glassy (As2S3)x(As2Se3)1-x films

被引：0

作者：

Goglidze, T. I.

Dement'ev, I. V.

Ishimov, V. M.

Senokosov, E. A.

机构：

[1] Transnistria State Univ, MD-3300 Tiraspol, Moldova

[2] Moldova State Univ, MD-2009 Kishinev, Moldova

来源：

INORGANIC MATERIALS | 2007年 / 43卷 / 01期

关键词：

D O I：

10.1134/S0020168507010189

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have studied the effect of thermal evaporation rate on the basic physical properties of glassy (As2S3)(x)(As2Se3)(1-x) thin films on glass substrates and have determined the optimal range of deposition rates corresponding to the highest photosensitivity and long-term stability of the films. The results are interpreted in terms of the interaction between the deposit and the residual gas in the vacuum chamber.

引用

页码：90 / 93

页数：4

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