Pressure-dependent phase matching for high harmonic generation of Ar and N2 in the tight focusing regime

被引：14

作者：

Niu, Yong ^{[1
]}

Liu, Fangyuan ^{[1
]}

Liu, Yi ^{[1
]}

Liang, Hongjing ^{[1
]}

Yang, Yujun ^{[1
]}

Ma, Ri ^{[1
]}

Ding, Dajun ^{[1
]}

机构：

[1] Jilin Univ, Inst Atom & Mol Phys, Changchun 130012, Peoples R China

来源：

OPTICS COMMUNICATIONS | 2017年 / 397卷

基金：

中国国家自然科学基金;

关键词：

High harmonic generation; Phase matching; Tight focusing; Pressure dependence; ATTOSECOND PULSE; COHERENT; RADIATION; 1064-NM; SOFT;

D O I：

10.1016/j.optcom.2017.03.059

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We experimentally investigate gas pressure-dependent effect on the high harmonic generation (HHG) of Ar and N-2 gases in a tight focusing regime with near IR ultrafast laser fields. Different from a loose-focusing condition, the measured data show a shift of the pressure regime for phase matching towards to the lower pressure side with the increasing driven laser intensity. By comparing the results with a theoretical calculation based on the Constant' one-dimensional model, we illustrate that this pressure dependence stems from the Gaussian beam phase gradient and atomic dipole phase which can become the key factors for phase matching in the tight focusing regime, interested in a high-repetition-rate coherent extreme-ultraviolet generation.

引用

页码：118 / 121

页数：4

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