Separation of bulk and surface-losses in low-loss EELS measurements in STEM

被引:40
|
作者
Mkhoyan, K. A. [1 ]
Babinec, T.
Maccagnano, S. E.
Kirkland, E. J.
Silcox, J.
机构
[1] Cornell Univ, Sch Appl & Engn Phys, Ithaca, NY 14853 USA
[2] Univ Michigan, Dept Phys, Ann Arbor, MI 48109 USA
基金
美国国家科学基金会;
关键词
EELS; STEM; plasmon-loss; surface-loss; dielectric function; Si;
D O I
10.1016/j.ultramic.2006.09.003
中图分类号
TH742 [显微镜];
学科分类号
摘要
To identify major features in low electron energy loss spectra, the different excitations (bulk plasmons, interband transitions, surface plasmons. Cherenkov and surface guided modes) must be delineated from each other. In this paper, this process is achieved by noting the linear thickness dependence of bulk processes contrasted with the constant thickness behavior Of Surface excitations. An alternative approach of analyzing bulk plasmon-loss is also introduced. Using a new algorithm, the parameters of plasma generation-plasmon energy E-P,E-0, a damping parameter Delta E-P and the coefficient of the dispersion relation gamma were obtained from a single curve fitting on the example of Si. The ability to separate surface-losses from the rest of the data permitted identification of the fine Structure of the surface-losses. The strong peak at 8.2 eV characteristic of non-radiative surface plasmon excitations was measured for Si. Analysis of surface excitations indicates that a 10 angstrom SiO2, surface coating layer is still present despite careful cleaning the specimen. Dielectric functions deduced from the EELS data prove to be considerably affected by the presence of the surface-losses for samples as thick as 800 A. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:345 / 355
页数:11
相关论文
共 50 条
  • [1] Low-loss EELS methods
    Eljarrat A.
    Estradé S.
    Peiró F.
    [J]. Advances in Imaging and Electron Physics, 2019, 209 : 49 - 77
  • [2] Waveguide modes spatially resolved by low-loss STEM-EELS
    Kordahl, David
    Alexander, Duncan T. L.
    Dwyer, Christian
    [J]. PHYSICAL REVIEW B, 2021, 103 (13)
  • [3] Retrieving the energy-loss function from valence electron energy-loss spectrum: Separation of bulk-, surface-losses and Cherenkov radiation
    Meng, Qingping
    Wu, Lijun
    Xin, Huolin L.
    Zhu, Yimei
    [J]. ULTRAMICROSCOPY, 2018, 194 : 175 - 181
  • [4] Model-based determination of dielectric function by STEM low-loss EELS
    Zhang, Liang
    Turner, Stuart
    Brosens, Fons
    Verbeeck, Jo
    [J]. PHYSICAL REVIEW B, 2010, 81 (03)
  • [5] IMPURITY CONTENT AND SPECTRAL LOSSES OF LOW-LOSS BULK GLASSES FOR OPTICAL FIBERS
    KAISER, P
    [J]. AMERICAN CERAMIC SOCIETY BULLETIN, 1973, 52 (04): : 385 - 385
  • [6] Contamination and the quantitative exploitation of EELS low-loss experiments
    Schamm, S
    Zanchi, G
    [J]. ULTRAMICROSCOPY, 2001, 88 (03) : 211 - 217
  • [7] Nanoscale Chemical Evolution of Silicon Negative Electrodes Characterized by Low-Loss STEM-EELS
    Boniface, Maxime
    Quazuguel, Lucille
    Danet, Julien
    Guyomard, Dominique
    Moreau, Philippe
    Bayle-Guillemaud, Pascale
    [J]. NANO LETTERS, 2016, 16 (12) : 7381 - 7388
  • [8] ON THE MEASUREMENT OF SURFACE STEP HEIGHTS BY LOW-LOSS IMAGING IN STEM
    TREACY, MMJ
    BELLESSA, J
    [J]. ULTRAMICROSCOPY, 1983, 11 (2-3) : 173 - 178
  • [9] LOW-LOSS SURFACE IMAGING OF THIN-FILMS IN THE STEM
    TREACY, MMJ
    SMITH, DA
    KRAKOW, W
    TRAFAS, G
    [J]. INSTITUTE OF PHYSICS CONFERENCE SERIES, 1982, (61): : 429 - 430
  • [10] Low-loss EELS of 2D boron nitride
    Nicholls, R. J.
    Perkins, J. M.
    Nicolosi, V.
    McComb, D. W.
    Nellist, P. D.
    Yates, J. R.
    [J]. ELECTRON MICROSCOPY AND ANALYSIS GROUP CONFERENCE 2011 (EMAG 2011), 2012, 371