High-Speed Electro-Thermal Measurements in RF Power Amplifiers Using Thermo-Reflectance

被引:0
|
作者
Jindal, Gautam [1 ]
Pomeroy, James W. [2 ]
Watkins, Gavin T. [3 ]
Morris, Kevin [1 ]
Kuball, Martin [2 ]
Cappello, Tommaso [1 ]
机构
[1] Univ Bristol, Commun Syst & Network Grp, Bristol, Avon, England
[2] Univ Bristol, Ctr Device Thermog & Reliabil, Bristol, Avon, England
[3] Toshiba Res Europe Ltd, Bristol, Avon, England
基金
英国工程与自然科学研究理事会;
关键词
Gallium-Nitride (GaN); memory effects; modelling; modulated signals; power amplifier; reflectometry; temperature; thermal resistance; radio-frequency (RF);
D O I
10.1109/INMMIC54248.2022.9762126
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The methodology presented here provides a route for directly performing high-speed electro-thermal characterisation on a Power Amplifier (PA) using Thermo Reflectance method. Starting the analysis with RF pulses, the PA electrical and thermal behaviour at different ambient/baseplate temperatures and dissipation profiles is measured with the presented setup. After this, the on-chip intra-finger temperature of this PA, based on a GaN-on-SiC Wolfspeed CG2H40010F transistor, is measured by considering high-PAPR signals with bandwidths of 10 kHz, 100 kHz, and 10 MHz. For the 10 MHz modulated signal, no in-signal temperature fluctuations are observed during the amplification, whereas for 10 kHz a maximum variation of +/- 7 degrees C and +/- 3 degrees C for a 100 kHz signal is measured.
引用
收藏
页数:3
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