Resolution and depth of focus in optical lithography

被引：7
|
作者：
Mack, CA
机构：
来源：
MICROLITHOGRAPHIC TECHNIQUES IN IC FABRICATION | 1997年 / 3183卷
关键词：
resolution; depth of focus; microlithography; optical lithography; lithography simulation;
D O I：
10.1117/12.280550
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Common uses of the terms ''resolution'' and ''depth of focus'' (DOF) are explored as they relate to semiconductor lithography. A definition of DOF; is given which is most appropriate to photolithography for IC manufacturing Examples of the use of the definition for DOF for studying trends in lithography are given. Resolution is then defined based on realistic requirements for semiconductor manufacturing. Using this definition. of resolution, the common scaling law of resolution with numerical aperture is shown to be inaccurate under typical conditions.
引用
收藏
页码：14 / 27
页数：14
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