Effects of Cooling Process on GaN Crystal Growth by Na Flux Method

被引:3
|
作者
Zhou, Mingbin [1 ]
Li, Zhenrong [2 ,3 ]
Fan, Shiji [2 ,3 ]
Xiong, Zhihua [1 ]
Luo, Gen [1 ]
机构
[1] Jiangxi Sci & Technol Normal Univ, Key Lab Optoelect & Commun Jiangxi Prov, Nanchang 330038, Jiangxi, Peoples R China
[2] Xi An Jiao Tong Univ, Elect Mat Res Lab, Key Lab, Minist Educ, Xian 710049, Peoples R China
[3] Xi An Jiao Tong Univ, Int Ctr Dielect Res, Xian 710049, Peoples R China
基金
中国国家自然科学基金;
关键词
GaN crystal; Na flux; cooling process; growth temperature; SINGLE-CRYSTALS; DENSITY; MELT;
D O I
10.1007/s11664-020-08230-7
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effects of cooling on the yield (percentage of Ga in the original melt that is incorporated into the GaN crystal) and morphology of GaN crystals grown by the Na flux method have been investigated. Yields of pyramidal GaN crystals of up to 94.9% were obtained by spontaneous crystallization using the slow cooling method. A lower cooling rate contributed to higher yield of GaN crystals. Scanning electron microscopy observations indicated that the crystalline perfection increased as the cooling rate was decreased. Instabilities such as macrosteps, cellular structures, and hopper crystals (a form of crystal defined by its "hoppered" shape) were observed after crystal growth at higher cooling rates. These results suggest ways to improve the yield and control the growth of perfect GaN crystals.
引用
收藏
页码:5260 / 5265
页数:6
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