Preparation of wide range refractive index diamond-like carbon films by means of plasma-enhanced chemical vapor deposition

被引:9
|
作者
Gharibyan, A. [1 ]
Hayrapetyan, D. [1 ,2 ]
Panosyan, Zh. [1 ]
Yengibaryan, Ye. [1 ]
机构
[1] State Engn Univ Armenia, Heliotech Lab, Yerevan 0009, Armenia
[2] Russian Armenian Slavon Univ, Yerevan 0051, Armenia
关键词
D O I
10.1364/AO.50.000G69
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Plasma-enhanced chemical vapor deposition technology has been elaborated for obtaining diamond-like carbon (DLC) coatings of a wide range of properties. Alternative and direct bias voltages have been applied on the substrate, and refractive index dependencies upon various deposition technological parameters have been investigated. The frequency of the bias voltage has been varied in the region of 150-450 kHz. The maximum refractive index range that has been achieved is 1.46-3.2. Thin DLC films have been prepared on crystalline silicon substrates. Because of the wide range of physical, optical, and mechanical properties of the obtained films, they can successfully be applied in different fields of nano-optics. (C) 2011 Optical Society of America
引用
下载
收藏
页码:G69 / G73
页数:5
相关论文
共 50 条
  • [1] Diamond-like carbon films deposited on polycarbonates by plasma-enhanced chemical vapor deposition
    Guo, C. T.
    THIN SOLID FILMS, 2008, 516 (12) : 4053 - 4058
  • [2] Magnetron plasma-enhanced chemical vapor deposition of diamond-like carbon thin films
    Anita, V
    Saito, N
    Takai, O
    THIN SOLID FILMS, 2006, 506 : 63 - 67
  • [3] Diamond-like carbon films deposited on polymers by plasma-enhanced chemical vapor deposition
    Cuong, NK
    Tahara, M
    Yamauchi, N
    Sone, T
    SURFACE & COATINGS TECHNOLOGY, 2003, 174 : 1024 - 1028
  • [4] Surface studies of diamond-like carbon films grown by plasma-enhanced chemical vapor deposition
    Maheswaran, R.
    Sivaraman, R.
    Mahapatra, O.
    Rao, P. C.
    Gopalakrishnan, C.
    Thiruvadigal, D. J.
    SURFACE AND INTERFACE ANALYSIS, 2010, 42 (12-13) : 1702 - 1705
  • [5] Fluorinated amorphous diamond-like carbon films deposited by plasma-enhanced chemical vapor deposition
    Yu, GQ
    Tay, BK
    Sun, Z
    SURFACE & COATINGS TECHNOLOGY, 2005, 191 (2-3): : 236 - 241
  • [6] Formation of Diamond-Like Carbon Films by Photoemission-Assisted Plasma-Enhanced Chemical Vapor Deposition
    Yang, Meng
    Takabayashi, Susumu
    Ogawa, Shuichi
    Hayashi, Hiroyuki
    Jesko, Radek
    Otsuji, Taiichi
    Takakuwa, Yuji
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2013, 52 (11)
  • [7] Plasma-enhanced chemical vapor deposition method to coat micropipettes with diamond-like carbon
    Kakuta, N
    Watanabe, M
    Yamada, Y
    Okuyama, N
    Mabuchi, K
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2005, 76 (07):
  • [8] Deposition of silicon-containing diamond-like carbon films by plasma-enhanced chemical vapour deposition
    Baba, K.
    Hatada, R.
    Flege, S.
    Ensinger, W.
    SURFACE & COATINGS TECHNOLOGY, 2009, 203 (17-18): : 2747 - 2750
  • [9] Plasma parameter investigation during plasma-enhanced chemical vapor deposition of silicon-containing diamond-like carbon films
    Grotjahn, T.
    Aslanbas, O.
    Mee, M.
    Koenig, M.
    Meier, S.
    SURFACE & COATINGS TECHNOLOGY, 2013, 237 : 126 - 134
  • [10] Synthesis of diamond-like carbon films on Si substrates by photoemission-assisted plasma-enhanced chemical vapor deposition
    Yang, Meng
    Ogawa, Shuichi
    Takabayashi, Susumu
    Otsuji, Taiichi
    Takakuwa, Yuji
    THIN SOLID FILMS, 2012, 523 : 25 - 28