Multiscale Simulations of triblock copolymers

被引:1
|
作者
Andzelm, Jan [1 ]
Beyer, Frederick L. [1 ]
Snyder, James [1 ]
Chung, Peter W. [1 ]
机构
[1] USA, Res Lab, Aberdeen Proving Ground, MD 21005 USA
关键词
D O I
10.1615/IntJMultCompEng.v5.i3-4.20
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Triblock copolymers self-assemble into a rich spectrum of microphase separated morphologies such as lamellae and cylinders. These materials are utilized in numerous materials science applications such as in membranes for protective clothing, fuel cells, and batteries. Such mesoscale features of copolymers extend to hundreds of nanometers and form in microseconds or longer times. However, many interesting processes, such as diffusion, occur within these mesoscale phases much faster and depend on underlying atomistic structure of the polymer. Such structure, in turn, is a function of molecular interactions at the fundamental quantum level. Thus comprehensive simulations of copolymers require consideration of quantum, atomistic, and mesoscale phenomena, spanning vastly different time and length scales. These simulations can be accomplished through sequential multiscale modeling. In this article, we describe key concepts and discuss interdependence and accuracy at various stages of this multiscale approach. Results are presented for a poly (styrene-b-isobutylene-b-styrene) copolymer that, in its sulfonated form, was found to be useful as a membrane in protective garments.
引用
收藏
页码:167 / 179
页数:13
相关论文
共 50 条
  • [41] Organogels from ABA triblock copolymers
    T. Dürrschmidt
    H. Hoffmann
    [J]. Colloid and Polymer Science, 2001, 279 : 1005 - 1012
  • [42] Morphology of films of SEBS triblock copolymers
    Han, X
    Liu, HL
    Dong, YM
    Hu, Y
    [J]. CHINESE JOURNAL OF CHEMICAL ENGINEERING, 2005, 13 (04) : 498 - 503
  • [43] Effect of shear on morphologies of triblock copolymers
    Muthukumar, M.
    [J]. Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering, 1994, 71
  • [44] Orientation of triblock copolymers in planar extension
    Lee, HH
    Register, RA
    Hajduk, DA
    Gruner, SM
    [J]. POLYMER ENGINEERING AND SCIENCE, 1996, 36 (10): : 1414 - 1424
  • [45] Siloxane triblock copolymers containing polyethyleneoxide
    Hamciuc, V
    Pricop, L
    Marcu, M
    Vlad, S
    Pricop, DS
    [J]. REVUE ROUMAINE DE CHIMIE, 2004, 49 (01) : 77 - 83
  • [46] Morphology of Films of SEBS Triblock Copolymers
    韩霞
    刘洪来
    董亚明
    胡英
    [J]. Chinese Journal of Chemical Engineering, 2005, (04) : 498 - 503
  • [47] Transporting ions in ABA triblock copolymers
    Long, Timothy E.
    Jangu, Chainika
    Margaretta, Evan D.
    Wang, Jing-Han H.
    Wang, Dong
    Heflin, James R.
    Colby, Ralph H.
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2014, 248
  • [48] Microstructure of triblock copolymers in asphalt oligomers
    Ho, RM
    Adedeji, A
    Giles, DW
    Hajduk, DA
    Macosko, CW
    Bates, FS
    [J]. JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS, 1997, 35 (17) : 2857 - 2877
  • [49] Gel transition of active triblock copolymers
    Shi, Zi-Xuan
    Jin, Yan
    Jin, Yi-Yang
    Tian, Wen-De
    Zhang, Tian-Hui
    Chen, Kang
    [J]. Wuli Xuebao/Acta Physica Sinica, 2024, 73 (17):
  • [50] TRIBLOCK COPOLYMERS VIA DIANIONIC INITIATORS
    GORDON, B
    BUCCA, D
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1988, 195 : 41 - POLY