Effect of various gases and chemical catalysts on phenol degradation pathways by pulsed electrical discharges

被引:54
|
作者
Shen, Yongjun [1 ]
Lei, Lecheng [1 ]
Zhang, Xingwang [1 ]
Zhou, Minghua [1 ]
Zhang, Yi [1 ]
机构
[1] Zhejiang Univ, Inst Environm Pollut Control Technol, Hangzhou 310028, Peoples R China
基金
中国国家自然科学基金;
关键词
pulsed electrical discharge; discharge atmosphere; chemical catalyst; intermediate product; degradation pathway;
D O I
10.1016/j.jhazmat.2007.05.024
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
The processes of phenol degradation by pulsed electrical discharges were investigated under several kinds of discharge atmospheres (oxygen, argon, nitrogen and ozone) and chemical catalysts (ferrous ion and hydrogen peroxide). The temporal variations of the concentrations of phenol and the intermediate products were monitored by HPLC and GC-MS, respectively. It has been found that the effect of various gases bubbling on phenol degradation rate ranked in the following order: oxygen-containing, ozone > oxygen > argon > nitrogen. The high gas bubbling flow rate was beneficial to the removal of phenol. It was found that the degradation proceeded differently when in the presence and absence of catalysts. The phenol removal rate was increased when ferrous ion was added. This considerable enhancement may be due to the Fenton's reaction. What's more, putting the chemical additives hydrogen peroxide into the reactor led to a dramatic increase in phenol degradation rate. The mechanism was due to the direct or indirect photolysis and pyrolysis destruction in plasma channel. Furthermore, the intermediate products were monitored by GC-VIS under three degradation conditions. More THBs were generated under degradation conditions without gases bubbling or adding any catalyst, and more DHBs under the condition of adding ferrous ion, and more carboxylic acids under the condition of oxygen-containing ozone gas bubbling. Consequently, three distinct degradation pathways based on different conditions were proposed. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:713 / 722
页数:10
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