Wet Chemical Etching Process of BST Thin Films for Pyroelectric Infrared Detectors

被引:5
|
作者
Zhang, Tianjin [1 ]
Huang, He [1 ]
Chen, Ren [1 ]
机构
[1] Hubei Univ, Sch Mat Sci & Engn, Wuhan 430062, Hubei, Peoples R China
关键词
Barium strontium titanate(BST); sol-gel processing; lift-off technique; wet chemical etching; etchant; INDUCTIVELY-COUPLED CL-2/AR; MECHANISM; PLASMA;
D O I
10.1080/00150193.2010.492740
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ba0.8Sr0.2TiO3 (BST) thin films were prepared on Pt/Ti/SiO2/Si substrates by sol-gel processing. The BST thin films were patterned by wet chemical etching and the electrodes were shaped by lift-off technique. An improved etchant with the volume ratio of HF:HNO3:H2O2:H2O = 1:25:50:20 was developed for BST films etching. SEM graph shows that the unetched BST thin film is dense, crack-free and pore-free. EDS analyses indicate that Ba, Sr and Ti elements of etched areas are removed completely. XRD and AFM results show that the etchant-induced damage of the etched BST films could be partially recovered by post-annealing treatment.
引用
收藏
页码:137 / 144
页数:8
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