Wet chemical etching method for BST thin films annealed at high temperature

被引：9

作者：

Zhang, R. T. ^{[1
]}

Yang, C. R. ^{[1
]}

Yu, A. ^{[1
]}

Wang, B. ^{[1
]}

Tang, H. J. ^{[1
]}

Chen, H. W. ^{[1
]}

Zhang, J. H. ^{[1
]}

机构：

[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R China

来源：

APPLIED SURFACE SCIENCE | 2008年 / 254卷 / 21期

关键词：

RF magnetron sputtering; wet chemical etching; annealing temperature;

D O I：

10.1016/j.apsusc.2008.05.233

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

As a traditional etchant, pure buffered hydrofluoric acid (BHF), does not possess the ability to etch BST thin films annealed at high temperature, even though it works greatly on as-deposited Ba(0.5)Sr(0.5)TiO(3) (BST) films. In this paper, we developed an etchant by mixing BHF and strong acid (HNO(3), HCl, H(2)SO(4) and H(3)PO(4)) and use it successfully on BST films annealed with high temperature. The experimental results show that a 1-8 wt% of strong acid acts as an efficient catalyst and the etching speed is significantly improved. The etched BST films show little distortions and smooth etching edges were recorded. (C) 2008 Elsevier B. V. All rights reserved.

引用

页码：6697 / 6700

页数：4

共 50 条

[1] Wet Chemical Etching Process of BST Thin Films for Pyroelectric Infrared Detectors
Zhang, Tianjin
Huang, He
Chen, Ren
[J]. FERROELECTRICS, 2011, 410 : 137 - 144
[2] High-fidelity patterning of AlN and ScAlN thin films with wet chemical etching
Airola, Konsta
Mertin, Stefan
Likonen, Jari
Hartikainen, Enni
Mizohata, Kenichiro
Dekker, James
Sebastian, Abhilash Thanniyil
Pensala, Tuomas
[J]. MATERIALIA, 2022, 22
[3] Chemical reduction and wet etching of CeO2 thin films
Kossoy, A
Greenberg, M
Gartsman, K
Lubomirsky, I
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2005, 152 (02) : C65 - C66
[4] Wet-chemical etching of SrMoO3 thin films
Mani, Arzhang
Nikfalazar, Mohammad
Muench, Falk
Radetinac, Aldin
Zheng, Yuliang
Wiens, Alex
Melnyk, Sergiy
Maune, Holger
Alff, Lambert
Jakoby, Rolf
Komissinskiy, Philipp
[J]. MATERIALS LETTERS, 2016, 184 : 173 - 176
[5] Patterning of platinum (Pt) thin films by chemical wet etching in Aqua Regia
Koellensperger, P. A.
Karl, W. J.
Ahmad, M. M.
Pike, W. T.
Green, M.
[J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2012, 22 (06)
[6] LANGMUIR PROCESS FOR FORMING THIN FILMS BY A WET CHEMICAL METHOD
HOLT, J
[J]. VACUUM, 1967, 17 (04) : 225 - &
[7] Wet chemical synthesis of silver nanowire thin films at ambient temperature
Zhang, DB
Qi, LM
Yang, JH
Ma, JM
Cheng, HM
Huang, L
[J]. CHEMISTRY OF MATERIALS, 2004, 16 (05) : 872 - 876
[8] Temperature Stabilization of BST Thin Films: A Critical Review
Cole, M. W.
[J]. FERROELECTRICS, 2014, 470 (01) : 67 - 89
[9] WET ETCHING OF THIN SNO2 FILMS
GUEORGUIEV, VK
POPOVA, LI
BESHKOV, GD
TOMAJOVA, NA
[J]. SENSORS AND ACTUATORS A-PHYSICAL, 1990, 24 (01) : 61 - 63
[10] DEPOSITION AND CHEMICAL ETCHING OF HIGH-TEMPERATURE SUPERCONDUCTOR FILMS
SHIH, I
QIU, CX
[J]. MICROELECTRONIC PACKAGING TECHNOLOGY: MATERIALS AND PROCESSES, 1989, : 375 - 382

← 1 2 3 4 5 →