Field emission characteristics of boron nitride films deposited on Si substrates with cubic boron nitride crystal grains

被引:15
|
作者
Kimura, C [1 ]
Yamamoto, T [1 ]
Sugino, T [1 ]
机构
[1] Osaka Univ, Dept Elect Engn, Suita, Osaka 5650871, Japan
来源
关键词
D O I
10.1116/1.1361042
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Field emission characteristics are investigated for boron nitride (BN) films deposited on Si substrates with cubic (c-)BN crystal grains. A comparative study of field emission characteristics is performed for the BN samples with and without c-BN grains. The turn-on electric fields are 7 and 18 V/mum for the BN samples with and without c-BN grains, respectively. A significant reduction in the turn-on electric field of the electron emission is found for the sample with c-BN grains. Fowler-Nordheim plots of the field emission characteristics suggest a variation in the field enhancement factor between the BN samples with and without c-BN crystal grains. It is also found that c-BN crystal grains are effective in increasing electron emission area. (C) 2001 American Vacuum Society.
引用
收藏
页码:1051 / 1054
页数:4
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