In this paper, a novel high-K/low-K compound passivation AlGaN/GaN Schottky Barrier Diode (CPG-SBD) is proposed to improve the off-state characteristics of AlGaN/GaN schottky barrier diode with gated edge termination (GET-SBD) by adding low-K( blocks in to the high-K passivation layer. The reverse leakage current of CPG-SBD can be reduced to 1.6 nA/mm by reducing the thickness of high-K dielectric under GET region to 5 nm, while the forward voltage and on-state resistance keep 1 V and 3.8 Omega mm, respectively. Breakdown voltage of CPG-SBDs can be improved by inducing discontinuity of the electric field at the high-K/low-K( interface. The breakdown voltage of the optimized CPG-SBD with 4 blocks of low-K can reach 1084 V with anode to cathode distance of 5 mu m yielding a high FOM of 5.9 GW/cm(2). From the C-V simulation results, CPG-SBDs induce no parasitic capacitance by comparison of the GET-SBDs. (C) 2017 Elsevier Ltd. All rights reserved.
机构:
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of ChinaState Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China
机构:
Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Kang, Xuanwu
Zheng, Yingkui
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Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Zheng, Yingkui
Wu, Hao
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Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Wu, Hao
Wei, Ke
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Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Wei, Ke
Sun, Yue
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Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Delft Univ Technol, Dept Microelect, NL-2628 CD Delft, NetherlandsChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Sun, Yue
Zhang, Guoqi
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Delft Univ Technol, Dept Microelect, NL-2628 CD Delft, NetherlandsChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
Zhang, Guoqi
Liu, Xinyu
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Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China
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Hosei Univ, Res Ctr Ion Beam Technol, 3-7-2 Kajino Cho, Koganei, Tokyo 1848584, JapanHosei Univ, Res Ctr Ion Beam Technol, 3-7-2 Kajino Cho, Koganei, Tokyo 1848584, Japan
Yoshino, Michitaka
Horikiri, Fumimasa
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Sciocs Co Ltd, Dept Engn, 880 Isagosawa Cho, Hitachi, Ibaraki 3191418, JapanHosei Univ, Res Ctr Ion Beam Technol, 3-7-2 Kajino Cho, Koganei, Tokyo 1848584, Japan
Horikiri, Fumimasa
Ohta, Hiroshi
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Hosei Univ, Res Ctr Micronano Technol, 3-11-15 Midori Cho, Koganei, Tokyo 1840003, JapanHosei Univ, Res Ctr Ion Beam Technol, 3-7-2 Kajino Cho, Koganei, Tokyo 1848584, Japan
Ohta, Hiroshi
Yamamoto, Yasuhiro
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Hosei Univ, Grad Sch Sci & Engn, 3-7-2 Kajino Cho, Koganei, Tokyo 1848584, JapanHosei Univ, Res Ctr Ion Beam Technol, 3-7-2 Kajino Cho, Koganei, Tokyo 1848584, Japan
Yamamoto, Yasuhiro
Mishima, Tomoyoshi
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Hosei Univ, Res Ctr Ion Beam Technol, 3-7-2 Kajino Cho, Koganei, Tokyo 1848584, JapanHosei Univ, Res Ctr Ion Beam Technol, 3-7-2 Kajino Cho, Koganei, Tokyo 1848584, Japan
Mishima, Tomoyoshi
Nakamura, Tohru
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Hosei Univ, Grad Sch Sci & Engn, 3-7-2 Kajino Cho, Koganei, Tokyo 1848584, JapanHosei Univ, Res Ctr Ion Beam Technol, 3-7-2 Kajino Cho, Koganei, Tokyo 1848584, Japan