Simulation design of high reverse blocking high-K/low-K compound passivation AlGaN/GaN Schottky barrier diode with gated edge termination

被引:4
|
作者
Bai, Zhiyuan [1 ]
Du, Jiangfeng [1 ]
Xin, Qi [1 ]
Li, Ruonan [1 ]
Yu, Qi [1 ]
机构
[1] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China
基金
中国国家自然科学基金;
关键词
AlGaN/GaN Schottky barrier diode; Gated edge termination; High-K/low-K compound passivation; Breakdown voltage; Reverse leakage current; LOW ONSET VOLTAGE; TURN-ON VOLTAGE; LEAKAGE-CURRENT; ANODE; PERFORMANCE; HEMTS; HETEROSTRUCTURE; ENHANCEMENT; RECTIFIER; TRENCH;
D O I
10.1016/j.spmi.2017.07.060
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
In this paper, a novel high-K/low-K compound passivation AlGaN/GaN Schottky Barrier Diode (CPG-SBD) is proposed to improve the off-state characteristics of AlGaN/GaN schottky barrier diode with gated edge termination (GET-SBD) by adding low-K( blocks in to the high-K passivation layer. The reverse leakage current of CPG-SBD can be reduced to 1.6 nA/mm by reducing the thickness of high-K dielectric under GET region to 5 nm, while the forward voltage and on-state resistance keep 1 V and 3.8 Omega mm, respectively. Breakdown voltage of CPG-SBDs can be improved by inducing discontinuity of the electric field at the high-K/low-K( interface. The breakdown voltage of the optimized CPG-SBD with 4 blocks of low-K can reach 1084 V with anode to cathode distance of 5 mu m yielding a high FOM of 5.9 GW/cm(2). From the C-V simulation results, CPG-SBDs induce no parasitic capacitance by comparison of the GET-SBDs. (C) 2017 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1000 / 1009
页数:10
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