The new LED-Sensitive photoinitiators of Polymerization: Copper complexes in free radical and cationic photoinitiating systems and application in 3D printing
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Borjigin, Timur
[1
,2
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Noirbent, Guillaume
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Aix Marseille Univ, CNRS, ICR UMR 7273, F-13397 Marseille, FranceUniv Haute Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France
Noirbent, Guillaume
[3
]
Gigmes, Didier
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Aix Marseille Univ, CNRS, ICR UMR 7273, F-13397 Marseille, FranceUniv Haute Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France
Gigmes, Didier
[3
]
Xiao, Pu
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Australian Natl Univ, Res Sch Chem, Canberra, ACT 2601, AustraliaUniv Haute Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France
Xiao, Pu
[4
]
Dumur, Frederic
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Aix Marseille Univ, CNRS, ICR UMR 7273, F-13397 Marseille, FranceUniv Haute Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France
Dumur, Frederic
[3
]
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Lalevee, Jacques
[1
,2
]
机构:
[1] Univ Haute Alsace, CNRS, IS2M UMR 7361, F-68100 Mulhouse, France
[2] Univ Strasbourg, Strasbourg, France
[3] Aix Marseille Univ, CNRS, ICR UMR 7273, F-13397 Marseille, France
[4] Australian Natl Univ, Res Sch Chem, Canberra, ACT 2601, Australia
A ligand (A1) and four copper complexes (Cu1, Cu2, Cu3 and Cu4) were examined as photosensitizers in various photoinitiating systems (PISs). Interestingly, excellent photochemical reactivities were determined with the different compounds. Especially, notable photoinitiation abilities were determined upon exposure to LED@405 nm during the free radical polymerization of acrylates and the cationic polymerization of epoxides when combined with an iodonium salt and an amine. With regards to their remarkable reactivities, the different photoinitiating systems were applied to 3D printing experiments. By combining steady state photolysis and electron spin resonance spin trapping, the chemical mechanism supporting the polymerization processes could be fully detailed and proved. Among all PISs studied, the three-component PISs furnished the best monomer conversions during the free radical polymerization of trimethylolpropane triacrylate (TMPTA) and the cationic polymerization of (3,4-epoxycyclohexane)methyl 3,4-epoxycyclohexylcarboxylate (EPOX) monomers. The conversion process was monitored by real-time Fourier transform infrared spectroscopy (RT-FTIR). Three-component PISs based on A1, Cu1 and Cu2 showed better performances than those based on Cu3, Cu4 and the different twocomponent PIS (comprising only the iodonium salt or the amine) in FRP experiments. Based on the outstanding photoinitiation abilities of A1 and Cu1 with both TMPTA and EPOX, smooth and regular 3D patterns could be obtained by direct laser write experiments by generating interpenetrating polymer networks (IPN) with the blend of these two monomers.
机构:
Univ Haute Alsace, CNRS, IS2 M UMR 7361, F-68100 Mulhouse, France
Univ Strasbourg, Strasbourg, FranceUniv Haute Alsace, CNRS, IS2 M UMR 7361, F-68100 Mulhouse, France
Chen, Hong
Pieuchot, Laurent
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Univ Haute Alsace, CNRS, IS2 M UMR 7361, F-68100 Mulhouse, France
Univ Strasbourg, Strasbourg, FranceUniv Haute Alsace, CNRS, IS2 M UMR 7361, F-68100 Mulhouse, France
Pieuchot, Laurent
Xiao, Pu
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Australian Natl Univ, Res Sch Chem, Canberra, ACT 2601, AustraliaUniv Haute Alsace, CNRS, IS2 M UMR 7361, F-68100 Mulhouse, France
Xiao, Pu
Dumur, Frederic
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Aix Marseille Univ, CNRS, ICR UMR 7273, F-13397 Marseille, FranceUniv Haute Alsace, CNRS, IS2 M UMR 7361, F-68100 Mulhouse, France
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South China Univ Technol, Sch Chem & Chem Engn, Guangzhou 510641, Guangdong, Peoples R ChinaSouth China Univ Technol, Sch Chem & Chem Engn, Guangzhou 510641, Guangdong, Peoples R China
Luo, Jiangyu
Qu, Jinqing
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South China Univ Technol, Sch Chem & Chem Engn, Guangzhou 510641, Guangdong, Peoples R China
Enterprises Key Lab Environm Friendly Coatings Gua, Jiangmen 529085, Guangdong, Peoples R ChinaSouth China Univ Technol, Sch Chem & Chem Engn, Guangzhou 510641, Guangdong, Peoples R China
机构:
POLYMAT and Polymers and Advanced Materials, Physics, Chemistry and Technology Department, Faculty of Chemistry, UPV/EHU, Avda. Tolosa 72, San SebastianPOLYMAT and Polymers and Advanced Materials, Physics, Chemistry and Technology Department, Faculty of Chemistry, UPV/EHU, Avda. Tolosa 72, San Sebastian
Peñas M.I.
Calafel M.I.
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POLYMAT and Polymers and Advanced Materials, Physics, Chemistry and Technology Department, Faculty of Chemistry, UPV/EHU, Avda. Tolosa 72, San SebastianPOLYMAT and Polymers and Advanced Materials, Physics, Chemistry and Technology Department, Faculty of Chemistry, UPV/EHU, Avda. Tolosa 72, San Sebastian
Calafel M.I.
Aguirresarobe R.H.
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POLYMAT and Polymers and Advanced Materials, Physics, Chemistry and Technology Department, Faculty of Chemistry, UPV/EHU, Avda. Tolosa 72, San SebastianPOLYMAT and Polymers and Advanced Materials, Physics, Chemistry and Technology Department, Faculty of Chemistry, UPV/EHU, Avda. Tolosa 72, San Sebastian
Aguirresarobe R.H.
Tierno M.
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ERCROS S.A., Innovation and Technology Department, Chlorine Derivatives Division, Diagonal 595, BarcelonaPOLYMAT and Polymers and Advanced Materials, Physics, Chemistry and Technology Department, Faculty of Chemistry, UPV/EHU, Avda. Tolosa 72, San Sebastian
Tierno M.
Conde J.I.
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ERCROS S.A., Innovation and Technology Department, Chlorine Derivatives Division, Diagonal 595, BarcelonaPOLYMAT and Polymers and Advanced Materials, Physics, Chemistry and Technology Department, Faculty of Chemistry, UPV/EHU, Avda. Tolosa 72, San Sebastian
Conde J.I.
Pascual B.
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ERCROS S.A., Innovation and Technology Department, Chlorine Derivatives Division, Diagonal 595, BarcelonaPOLYMAT and Polymers and Advanced Materials, Physics, Chemistry and Technology Department, Faculty of Chemistry, UPV/EHU, Avda. Tolosa 72, San Sebastian
Pascual B.
Santamaría A.
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POLYMAT and Polymers and Advanced Materials, Physics, Chemistry and Technology Department, Faculty of Chemistry, UPV/EHU, Avda. Tolosa 72, San SebastianPOLYMAT and Polymers and Advanced Materials, Physics, Chemistry and Technology Department, Faculty of Chemistry, UPV/EHU, Avda. Tolosa 72, San Sebastian