Multiscale modeling of block copolymer directed assembly: Effects of patterns, solvents and salts

被引：0
|
作者：
de Pablo, Juan [1 ]
机构：
[1] Univ Chicago, Inst Mol Engn, Chicago, IL 60637 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2014年 / 247卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
333-PMSE
引用
收藏
页数：1
相关论文
共 50 条
  • [41] The role of guide stripe chemistry in block copolymer directed self assembly
    Seidel, Robert
    Williamson, Lance
    Her, YoungJun
    Kim, Jihoon
    Lin, Guanyang
    Nealey, Paul
    Gronheid, Roel
    ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXII, 2015, 9425
  • [42] Surface patterns from block copolymer self-assembly
    Kim, Ho-Cheol
    Hinsberg, William D.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2008, 26 (06): : 1369 - 1382
  • [43] The Effects of Geometry and Chemistry of Nanopatterned Substrates on the Directed Self-Assembly of Block-Copolymer Melts
    Garner, Grant
    Williamson, Lance
    Seidel, Robert
    Delgadillo, Paulina Rincon
    Hur, Su-Mi
    Gronheid, Rod L.
    Nealey, Paul F.
    de Pablo, Juan J.
    ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES VII, 2015, 9423
  • [44] Experimental Demonstration of Aperiodic Patterns of Directed Self-Assembly by Block Copolymer Lithography for Random Logic Circuit Layout
    Chang, Li-Wen
    Bao, Xinyu
    Bencher, Chris
    Wong, H. -S. Philip
    2010 INTERNATIONAL ELECTRON DEVICES MEETING - TECHNICAL DIGEST, 2010,
  • [45] The One-Pot Directed Assembly of Cylinder-Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning
    Chang, Tzu-Hsuan
    Xiong, Shisheng
    Liu, Chi-Chun
    Liu, Dong
    Nealey, Paul F.
    Ma, Zhenqiang
    MACROMOLECULAR RAPID COMMUNICATIONS, 2017, 38 (18)
  • [46] Defect Rectification in High-Density Patterns through Directed Self-Assembly of Advanced Block Copolymer Architectures
    Yun, Sehyun
    Ahn, Jihun
    Thapar, Vikram
    Lee, Sangyeop
    Li, Sheng
    Hur, Su-mi
    ADVANCED FUNCTIONAL MATERIALS, 2025,
  • [47] Directed self assembly of block copolymers using chemical patterns with sidewall guiding lines, backfilled with random copolymer brushes
    Pandav, Gunja
    Durand, William J.
    Ellison, Christopher J.
    Willson, C. Grant
    Ganesan, Venkat
    SOFT MATTER, 2015, 11 (47) : 9107 - 9114
  • [48] Graphoepitaxial Directed Self-Assembly of Polystyrene-Block-Polydimethylsiloxane Block Copolymer on Substrates Functionalized with Hexamethyldisilazane to Fabricate Nanoscale Silicon Patterns
    Borah, Dipu
    Rasappa, Sozaraj
    Senthamaraikannan, Ramsankar
    Holmes, Justin D.
    Morris, Michael A.
    ADVANCED MATERIALS INTERFACES, 2014, 1 (03):
  • [49] Amphilic block copolymer self-assembly for directed synthesis of drug nanoparticles
    Prud'homme, Robert K.
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2006, 231
  • [50] Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films
    Kim, Dong Hyup
    Suh, Ahram
    Park, Geonhyeong
    Yoon, Dong Ki
    Kim, So Youn
    ACS APPLIED MATERIALS & INTERFACES, 2021, 13 (04) : 5772 - 5781
12345