The importance of network structure in high-k dielectrics:: LaAlO3, Pr2O3, and Ta2O5 -: art. no. 044102

被引：15
|
作者：
Busani, T
Devine, RAB
机构：
[1] USAF, Res Labs, Space Vehicles Directorate, Kirtland AFB, NM 87177 USA
[2] CNRS, Electrostat & Mat Dielect Lab, F-38042 Grenoble, France
来源：
JOURNAL OF APPLIED PHYSICS | 2005年 / 98卷 / 04期
关键词：
D O I：
10.1063/1.2012513
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Measurements of the dielectric constant of amorphous and crystalline Pr2O3 are reported. The high value similar to 25 for the polycrystalline phase is discussed in terms of the network structure and comparison is made with heavy rare-earth oxide values. The specific cases of LaAlO3 and Ta2O5 are also discussed and the role of network structure evidenced and elucidated. A potential route to finding high k materials suitable for microelectronics applications is suggested. (c) 2005 American Institute of Physics.
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页数：5
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