Si substrate resistivity design for on-chip matching circuit based on electro-magnetic simulation

被引:0
|
作者
Ono, M [1 ]
Suematsu, N
Kubo, S
Nakajima, K
Iyama, Y
Takagi, T
Ishida, O
机构
[1] Mitsubishi Electr Corp, Informat Technol R&D Ctr, Kamakura, Kanagawa 2478501, Japan
[2] Mitsubishi Electr Corp, Syst LSI Div, Itami, Hyogo 6648641, Japan
关键词
Si-MMIC; electro-magnetic simulation; high resistivity Si substrate; low noise amplifier; spiral inductor;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
For on-chip matching Si-MMIC fabricated on a conventional low resistivity Si substrate, the loss of on-chip inductors is quite high due to the dielectric loss of the substrate. In order to reduce the loss of on-chip matching circuit, the use of high resistivity Si substrate is quite effective. By using electromagnetic simulation, the relationship between coplanar waveguide (CPW) transmission line characteristics and the resistivity of Si substrate is: discussed. Based on the simulated results, the resistivity of Si substrate is: designed to achieve lower dielectric loss than conductor loss. The effectiveness of high resistivity Si substrate is evaluated by the extraction of equivalent circuit model parameters of the fabricated on-chip spiral inductors and the measurement of the fabricated on-chip matching Si-MMIC LNA's.
引用
收藏
页码:923 / 930
页数:8
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