Role of oxygen adatoms in homoepitaxial growth of Cu(001)

被引:0
|
作者
Yata, M [1 ]
Rouch, H [1 ]
Nakamura, K [1 ]
机构
[1] Natl Res Inst Met, Ibaraki, Osaka 3050047, Japan
关键词
D O I
10.1557/PROC-528-59
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
O atoms segregate to the surface during Cu homoepitaxial growth on Cu(001)-(2 root 2x root 2)-O to retain the (2 root 2x root 2) surface. The presence of an O adlayer cn the Cu surface raises the barrier height for the surface diffusion of the Cu adatom and increases de transition temperature of the growth mode from step flow to layer by layer. The growth proceeds by site exchange between Cu adatoms and O atoms. The site-exchange rate competes with the Cn deposition rate. There exists a critical Cu deposition rate above which the O atoms can not exchange the sites with Cu adatoms. The critical Cu deposition rate obeys an Arrhenius relation and the active energy for the site-exchange is estimated at 0.66 eV.
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页码:59 / 65
页数:7
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