Deuterium retention near surface of TiO2 by low-voltage D2 plasma discharge

被引:2
|
作者
Matsunami, N. [1 ]
Tanaka, T. [1 ]
Ohno, N. [1 ]
Tokitani, M. [2 ]
机构
[1] Nagoya Univ, Energy Sci Div, ESI, Nagoya, Aichi 4648603, Japan
[2] Natl Inst Nat Sci, Natl Inst Fus Sci, Toki, Gifu 5095292, Japan
关键词
D O I
10.1002/pssc.200778343
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
We have investigated deuterium (D) uptake in TiO2 (rutile) films under exposure of low-energy D-2(+) ions and thermal release of D from TiO2 films. The amount of deuterium in the films was analysed by means of nuclear reaction analysis D(He-3, alpha)p. D-uptake under AC-glow discharge in D-2 pressure of similar to 90 Pa is compared with that under DC-discharge with well-defined energy of D-2(+) ions in D-2 pressure of similar to 0.1 Pa. The results imply that the effective energy of D-2(+) ions in AC-glow discharge is much lower than the energy derived from the applied voltage. The results are also compared with those for Ti sheet exposed to low-energy D-2(+) ions. We find that D-release temperature from TiO2 is considerably lower than from Ti, though D-uptake in TiO2 is smaller than in Ti. (C) 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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页码:923 / 926
页数:4
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