Emission Efficiency Dependence on the p-GaN Thickness in a High-Indium InGaN/GaN Quantum-Well Light-Emitting Diode

被引:6
|
作者
Liao, Che-Hao [1 ]
Chen, Chih-Yen
Chen, Horng-Shyang
Chen, Kuang-Yu
Chung, Wei-Lun
Chang, Wen-Ming
Huang, Jeng-Jie
Yao, Yu-Feng
Kiang, Yean-Woei
Yang, Chih-Chung
机构
[1] Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan
关键词
Internal quantum efficiency (IQE); light-emitting diode (LED); p-GaN; quantum-confined Stark effect; thermal annealing; COMPOSITION FLUCTUATION; LAYERS;
D O I
10.1109/LPT.2011.2169243
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The dependencies of quantum-well (QW) internal quantum efficiency (IQE) and device behaviors on the p-layer thickness in a high-indium InGaN/GaN QW light-emitting diode (LED) are demonstrated. During the high-temperature growths of the p-AlGaN and p-GaN layers, the QWs are thermally annealed to increase their IQEs and blue-shift the emission with increasing p-layer thickness. Meanwhile, the quantum-confined Stark effect is enhanced with increasing p-layer thickness to decrease the IQEs and red-shift the emission. Based on the counteraction between the two effects, the maximum IQE and the shortest emission wavelength are observed in a sample with an optimized p-layer thickness, which includes a p-AlGaN layer of 20 nm and a p-GaN layer of 60 nm in thickness under our growth conditions. The fabricated LEDs of different p-GaN thicknesses show the similar variation trends in emission efficiency and wavelength.
引用
收藏
页码:1757 / 1759
页数:3
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